Taiwan Semiconductor Manufacturing Comp. Ltd.

Wei-Yu Su

Dong-Hsu Cheng

Li-Kong Turn

Chin-Hsiang Lin

Heng-Hsin Liu

Tsai-Sheng Gau

Shy-Jay Lin

Chi-Hung Liao

Wen-Chuan Wang

Chih-Ming Ke

Yi-Ming Dai

Te-Chih Huang

Chun-Hung Kung

Li-Kong Tern

A method for photolithography in semiconductor manufacturing includes providing one or more masks for a wafer; defining a reference focus plane of a first mask of the one or more masks; defining a reference focus plane of a second mask of the one or more masks; and determining the best focus for the second mask based on the best focus of the first mask and the Z direction difference of the first and second masks, using the reference focus planes of the first and second masks.

System and method for photolithography in semiconductor manufacturing

Detecting haze formation on a mask by obtaining an optical property of the mask and determining progress of the haze formation based on the obtained optical property.

Mask haze early detection

A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (RN)Cl. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.

Reticle with antistatic coating

A pod for transporting reticles is made with a reticle support that has a &#x3a0;-shape and is provided with pins, whose arrangement matches the location of chrome-free areas on a reticle base. Due to that, the pins, when supporting the reticle, come into contact with the reticle in chrome-free areas thereof. Thus, scratching the metallic areas and releasing metallic particles is prevented from occurring.

Reticle pod and reticle with cut areas

The present invention is a method of protecting reticles from electrostatic damage during their use in manufacturing lines and while patterning photoresist films on device substrates. An anti-static layer comprised of an ammonium salt is formed on both sides of a pellicle which is then attached to a metal frame that has been coated with an anti-static layer of the ammonium salt. The frame with attached pellicle is connected to a reticle by an adhesive. Any electrostatic charges that form on the surface of the anti-static layers or on the reticle are conducted into the metal frame where they are dissipated. The ammonium salt is preferably (RN+) Cl&#x2014; in which (RN+) has the structure:where Y is an alkyl group or CH, m=1 to 10000, and Xis Cl.

Pellicle with anti-static/dissipative material coating to prevent electrostatic damage on masks

Growing community of inventors

Taipei, Taiwan

Wei-Yu Su