Taiwan Semiconductor Manufacturing Comp. Ltd.

Wei-Shuo Kao

Chia-Cheng Chen

Ching-Wei Wu

Kuang Ting Chen

Cheng Hung Lee

Chia-En Huang

Wun-Jie Lin

Hong-Chen Cheng

Jui-Che Tsai

Fu-An Wu

Jung-Ping Yang

Chih-Chieh Chiu

Hsiao-Lan Yang

Ling-Chang Hu

An integrated circuit includes a plurality of metal layers of bit cells of a memory cell array disposed in a first metal layer and extending in a first direction, a plurality of word lines of the memory cell array disposed in a second metal layer and extending in a second direction that is different from the first direction, and at least two conductive traces disposed in a third metal layer substantially adjacent to each other and extending at least partially across the memory cell array, a first one of the at least two conductive traces coupled to a driving source node of a write assist circuit, and a second conductive trace of the at least two conductive traces coupled to an enable input of the write-assist circuit, where the at least two conductive traces form at least one embedded capacitor having a capacitive coupling to the bit line.

Memory cell array including a write-assist circuit and embedded coupling capacitor and method of forming same

A method includes generating a first and a second internal clock signal from a clock signal, wherein a first internal clock signal edge of the first internal clock signal and a second internal clock signal edge of the second internal clock signal are generated from a same edge of the clock signal. A first one of the first and the second internal clock edges is used to trigger a first operation on a six-transistor (6T) Static Random Access Memory (SRAM) cell of a SRAM array. A second one of the first and the second internal clock edges is used to trigger a second operation on the 6T SRAM cell. The first and the second operations are performed on different ports of the 6T SRAM. The first and the second operations are performed within a same clock cycle of the clock signal.

Simultaneous two/dual port access on 6T SRAM

A device includes an active region formed of a semiconductor material, a gate dielectric at a surface of the active region, and a gate electrode over the gate dielectric. A first source/drain region and a second source/drain region are on opposite sides of the gate electrode. A Contact Etch Stop Layer (CESL) is over the first and the second source/drain regions. An Inter-Layer Dielectric (ILD) includes a top surface substantially level with a top surface of the gate electrode. A first contact plug is over and electrically connected to the first source/drain region. A second contact plug is over and aligned to the second source/drain region. The second contact plug and the second source/drain region are spaced apart from each other by a portion of the first CESL to form a capacitor.

Resistive memory and methods for forming the same

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Taichuang, Taiwan

Wei-Shuo Kao