Globalfoundries U.S. Inc.

Wei Liang

Souvick Mitra

Robert J Gauthier, Jr

Alain F Loiseau

Meng Miao

You Li

Anindya Nath

Vibhor Jain

Sagar Premnath Karalkar

Zhiqing Li

Alain François Loiseau

The present disclosure relates to semiconductor structures and, more particularly, to a device triggered silicon control rectifier (SCR) and methods of manufacture. the structure includes: a vertical silicon controlled rectifier having a diffusion region in a well of a semiconductor substrate; a vertical triggering device sharing the diffusion region with the vertical silicon controlled rectifier; and a body contact adjacent to the vertical triggering device and electrically connecting to the well.

Vertical device triggered silicon control rectifier

The present disclosure relates to semiconductor structures and, more particularly, to electrostatic discharge (ESD) devices and methods of manufacture. The structure (ESD device) includes: a bipolar transistor comprising a collector region, an emitter region and a base region; and a lateral ballasting resistance comprising semiconductor material adjacent to the collector region.

Fin-based and bipolar electrostatic discharge devices

A structure includes trigger control circuitry for an SCR including: a first transistor having two P-type semiconductor terminals connected to an Nwell and a Pwell of the SCR; a second transistor having two N-type semiconductor terminals connected to the Pwell and ground; and, optionally, an additional transistor having two P-type semiconductor terminals connected to the Nwell and ground. Control terminals of the transistors receive the same control signal (e.g., RST from a power-on-reset). When a circuit connected to the SCR for ESD protection is powered on, ESD risk is limited so RST switches to high. Thus, the first transistor and optional additional transistor turn off and the second transistor turns on, reducing leakage. When the circuit is powered down, the ESD risk increases so RST switches to low. Thus, the first transistor and optional additional transistor turn on and the second transistor turns off, lowering the trigger voltage and current.

Operating voltage-triggered semiconductor controlled rectifier

Disclosed are embodiments of a semiconductor structure that includes a semiconductor-controlled rectifier (e.g., for electrostatic discharge (ESD) protection). The SCR can be readily integrated into advanced semiconductor-on-insulator processing technology platforms (e.g., a fully depleted silicon-on-insulator (FDSOI) processing technology platform) that employ hybrid semiconductor substrates (i.e., semiconductor substrates with both bulk semiconductor and semiconductor-on-insulator regions) and is configured with an on-Pwell semiconductor-on-insulator gate structure that is tied to an anode terminal to effectively lower the SCR trigger voltage. To further lower the trigger voltage of the SCR, the Pwell on which the gate structure sits may be made narrower than the gate structure and/or the doping profile of the Pwell on which the gate structure sits may be graded (e.g., P to P− closer to insulator layer). Additionally, to minimize parasitic capacitance, the gate structure may be shorter in length than contact regions parallel and adjacent thereto.

Semiconductor-controlled rectifier with low trigger voltage for electrostatic discharge protection

Embodiments of the disclosure provide an electrostatic discharge (ESD) device, including: an input pad; an underlapped field effect transistor (UL-FET) with a trigger voltage Vt, including: an underlapped drain region coupled to the input pad; a source region coupled to ground; and a gate structure coupled to the input pad; and a blocking layer separating the underlapped drain region from the gate structure of the UL-FET by an underlap distance.

Ultra-low leakage electrostatic discharge device with controllable trigger voltage

An ESD protection device may be provided, including: a substrate including a first conductivity region and a second conductivity region arranged therein. The first conductivity region may include a first terminal region and a second terminal region electrically coupled with each other. The second conductivity region may include a third terminal region and a fourth terminal region electrically coupled with each other. The second conductivity region may further include a fifth terminal region electrically coupled with the first and second terminal regions. The fifth terminal region may be arranged laterally between the third terminal region and the fourth terminal region. The first conductivity region, the first terminal region, the third terminal region, and the fifth terminal region may have a first conductivity type. The second conductivity region, the second terminal region, and the fourth terminal region may have a second conductivity type different from the first conductivity type.

Electrostatic discharge protection devices and methods for fabricating electrostatic discharge protection devices

Embodiments of the disclosure provide a circuit structure and method to control electrostatic discharge (ESD) events in a resistor-capacitor (RC) circuit. Circuit structures according to the disclosure may include a trigger transistor coupled in parallel with the RC circuit, and a gate terminal coupled to part of the RC circuit. A mirror transistor coupled in parallel with the RC circuit transmits a current that is less than a current through the trigger transistor. A snapback device has a gate terminal coupled to a source or drain of the mirror transistor, and a pair of anode/cathode terminals coupled in parallel with the RC circuit. A current at the gate terminal of the snapback device, derived from current in the mirror transistor, controls an anode/cathode current flow in the snapback device.

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South Burlington, VT, United States of America

Wei Liang