Taiwan Semiconductor Manufacturing Comp. Ltd.

Wei-Kuan Yen

Jui-Chun Weng

Yi-Cheng Chiu

Yen-Chiang Liu

Kang-Tai Peng

In a method of fabricating at least one IC, doped regions are formed on a semiconductor wafer using a first photolithography mask, including at least one doped region of a test structure. Active regions are formed on the semiconductor wafer using a second photolithography mask, including active regions of the test structure. Electrical contacts are formed on the active regions of the test structure. Electrical resistances are measured between pairs of active regions of the test structure using the electrical contacts. At least one metric is determined indicating whether the doped regions are spatially aligned with the active regions based on the measured electrical resistances. In response to the at least one metric indicating the doped regions are spatially aligned with the active regions, completing fabrication of the at least one integrated circuit.

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Hsinchu, Taiwan

Wei-Kuan Yen