Taiwan Semiconductor Manufacturing Comp. Ltd.

Wei-Hao Lin

Ching-Yu Chang

Yu-Yu Chen

Kuan-Wei Huang

Jiing-Feng Yang

Chia-Wei Wu

Chang-Wen Chen

Meng-Shu Lin

Yu-Hsin Chan

A semiconductor structure and method of forming the same are provided. The method includes: forming a plurality of mandrel patterns over a dielectric layer; forming a first spacer and a second spacer on sidewalls of the plurality of mandrel patterns, wherein a first width of the first spacer is larger than a second width of the second spacer; removing the plurality of mandrel patterns; patterning the dielectric layer using the first spacer and the second spacer as a patterning mask; and forming conductive lines laterally aside the dielectric layer.

Semiconductor structure and methods of forming the same

Growing community of inventors

Hsinchu, Taiwan

Wei-Hao Lin