Macronix International Co., Ltd.

International Business Machines Corporation

Powertech Technology Inc.

Renyi Medical Co., Ltd.

Wei-Chih Chien

Erh-Kun Lai

Ming-Hsiu Lee

Yi-Chou Chen

Hsiang-Lan Lung

Kuo-Pin Chang

Kuang-Yeu Hsieh

Feng-Ming Lee

Matthew Joseph BrightSky

Feng-Min Lee

Kuang Yeu Hsieh

Christopher P Miller

Nanbo Gong

Ming-Daou Lee

Yan-Ru Chen

Chao-I Wu

Shih-Hung Chen

Hung-Hsin Hsu

Yu-Yu Lin

Hsin-Yi Ho

Wei-Chen Chen

Dai-Ying Lee

SangBum Kim

Huai-Yu Cheng

Chia-Jung Chen

Chiao-Wen Yeh

Tu-Shun Chen

Yung-Han Ho

I Yueh Chen

Chih-Chieh Yu

Chien Hung Yeh

Chien-Hung Yeh

Meng-Long Lai

A semiconductor structure is provided. The semiconductor structure includes a transistor and a memory device. The transistor includes a source, a drain, and a gate. The memory device is disposed at a drain side of the transistor and coupled to the drain. The memory device includes a first electrode, a switch layer, a memory layer, and a second electrode disposed sequentially. The first electrode is coupled to the drain.

Semiconductor structure and endurance test method using the same

The present application discloses a motion control method for dual-spindle machining and a dual-spindle machine apparatus. A control device performs data reconstruction of segmentation and checkpoint setting according to first and second data, respectively, to correspondingly form first and second instruction sequences, thereby simultaneously controlling two motion control cards, allowing two machining devices coupled at a back end of the motion control cards to perform machining on two opposite sides of a workpiece. With the checkpoints arranged in the instruction sequences, the machining devices each having one machining tool are provided with a collaboration mechanism, so that the control device is allowed to continue sending instructions of the next segment to the two motion control cards upon arrival of both the instruction sequences at the checkpoints. Thus, the simultaneous dual-spindle apparatus not only achieves the feature of high efficiency of single-side separate machining but also provides the feature of dual-side collaboration, solving the issue of damage caused by mutual interference during a synchronous dual-spindle operation.

Motion control method for dual-spindle machining, dual-spindle machining apparatus and computer program product

A multi-level cell (MLC) one-selector-one-resistor (1S1R) three-dimensional (3D) cross-point memory system includes at least one MLC 1S1R structure including a stacked arrangement of a phase change memory (PCM) cell and a threshold switch selector. An electrically conductive bit line is in electrical communication with the OTS selector, and an electrically conductive word line is in electrical communication with the PCM cell. A controller is in electrical communication with the bit line and the word line. The controller is configured to select at least one voltage pulse from a group of different voltage pulses comprising a read pulse, a partial set pulse, a set pulse, a partial reset pulse, and a reset pulse, and configured to deliver the selected at least one voltage pulse to the at least one MLC 1S1R structure.

Multi-level cell threshold voltage operation of one-selector-one-resistor structure included in a crossbar array

An integrated circuit includes a memory array including a plurality of memory cells disposed at respective cross points of a plurality of first access lines and a plurality of second access lines. A selected memory cell has a first threshold voltage Vth(S) of set state and a second threshold voltage Vth(R) of reset state. Control circuitry is configured to apply a write voltage Vw to the selected first access line during a write operation, to apply a read voltage Vr to the selected first access line during a read operation, and to apply a same inhibit voltage Vu to unselected first and second access lines during the write and read operations, where &#xbd;Vw&#x3e;Vu&#x3e;Vw&#x2212;Vth(S).

Fast switching 3D cross-point array

A phase change storage device, Integrated Circuit (IC) chip including the devices and method of manufacturing IC chips with the devices. The device includes a phase change storage region with multiple phase change regions, e.g., two (2), of different phase change material serially-connected between said program/read line and a select device conduction terminal.

Phase change storage device with multiple serially connected storage regions

A structure for a resistive memory device and a method to fabricate the same is disclosed. The method includes providing a bottom electrode comprising a metal and forming a memory layer on the bottom electrode. The memory layer includes a first layer of metal oxide, and a second layer including the nitrogen-containing metal oxide. A top electrode is formed over the memory layer.

Resistive RAM and fabrication method

A memory device and an operation method thereof are provided, and the operation method of the memory device includes following steps. A programming operation is performed to write an original data into a first memory array in the memory device. The original data in the first memory array is verified, and whether to generate a write signal is determined according to a verification result. An error correction code is generated according to the original data, and the error correction code and a write address are stored temporarily in a buffer circuit of the memory device. When the write signal is generated, the error correction code and the write address in the buffer circuit are written into a second memory array in the memory device.

Memory device and operation method

A device includes first and second pluralities of memory cells with memory elements and first and second capping materials on the first and second pluralities of memory cells. First and second capping materials can comprise lower and higher density silicon nitrides. The memory elements can include a programmable resistance memory material, and the capping materials can contact the memory elements. The first and second pluralities of memory cells can have a common cell structure. The first memory cells in the can comprise a top and bottom electrodes with a memory material therebetween and the first capping material contacting the memory material. Control circuits can apply different write algorithms to the first and second pluralities of memory cells. The first and second sets of memory cells can have different operational memory characteristics by forming the first and second capping layers using different capping materials but with the same cell structure.

Multiple phase change materials in an integrated circuit for system on a chip application

An operation method for a memory device is disclosed. An operation state of the memory device is determined. If to be operated in a first operation state, the memory device is applied by a reset pulse. If to be operated in a second operation state, the memory device is applied by the reset pulse and at least a first incremental pulse set verification current, and an allowable maximum current of the first incremental pulse set verification current is lower than a melt current. If to be operated in a third operation state, the memory device is applied by the reset pulse and at least a first identical pulse set verification current, and an allowable maximum current of the first identical pulse set verification current is lower than the melt current. If to be operated in a fourth operation state, the memory device is applied by a set pulse.

Memory device and operation method thereof

A self-rectified device is provided, comprising a bottom electrode, a patterned dielectric layer with a contact hole formed on the bottom electrode, a memory formed at the bottom electrode and substantially aligned with the contact hole, and a top electrode formed on the bottom electrode and filling into the contact hole to contact with the memory, wherein the top electrode comprises a N+ type semiconductor material or a P+ type semiconductor material, and the memory and the top electrode produce a self-rectified property.

Self-rectified device, method for manufacturing the same, and applications of the same

A resistive memory and a fabricating method thereof are provided. The resistive memory includes first and second electrodes, a variable resistance material layer, a first dielectric layer, and a second dielectric layer. The first electrode includes a first portion and a second portion. The second electrode is disposed opposite to the first electrode. The variable resistance material layer includes a sidewall and first and second surfaces opposite to each other, wherein the first surface is connected with the first portion of the first electrode and the second surface is electrically connected with the second electrode. The second portion surrounds the sidewall of the variable resistance material layer and is connected with the first portion. The first dielectric layer is disposed between the first and the second electrodes. The second dielectric layer is disposed between the variable resistance material layer and the second portion of the first electrode.

Resistive memory and fabricating method thereof

A resistance memory cell is provided and includes a first electrode, a tungsten metal layer, a metal oxide layer, and a second electrode. The tungsten metal layer is disposed on the first electrode. The metal oxide layer is disposed on the tungsten metal layer. The second electrode includes a first connection pad, a second connection pad, and a bridge portion electrically connected between the first connection pad and the second connection pad. The bridge portion is disposed on the metal oxide layer or surrounds the metal oxide layer. The resistance memory cell adjusts a resistivity of the metal oxide layer through a first current path, passing through the metal oxide layer and the tungsten metal layer, or a second current path extending from the first connection pad to the second connection pad.

Resistance memory cell and operation method thereof

A resistive memory and a method for controlling operations of the resistive memory are provided. The resistive memory has a first memory layer, a second memory layer and a medium layer. Each of the first memory layer and the second memory layer is used to store data. The medium layer is formed between the first memory layer and the second memory layer. The method comprises at least a step of measuring a resistance between the first memory layer and the second memory layer, and determining which one of a first state, a second state and a third state is a state of the resistive memory according to the measured resistance. A resistive memory array including an array of the above resistive memory units, word lines and bit lines is also described, wherein the word (bit) lines are coupled to the first (second) memory layers.

Resistive memory array and method for controlling operations of the same

A self-aligning stacked memory cell array structure and method for fabricating such structure. The memory cell array includes a stack of memory cells disposed adjacent to opposing sides of a conductive line that is formed within a trench. The memory cells are stacked such that the memory element surface of each memory cell forms a portion of the sidewall of the conductive line. The conductive line is formed within the trench such that electrical contact is made across the entire memory element surface of each memory cell. Such structure and method for making such structure is a self-aligning process that does not require the use of any additional masks.

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Taipei, Taiwan

Wei-Chih Chien