Taiwan Semiconductor Manufacturing Comp. Ltd.

Wei-Chang Zhao

Hidehiro Fujiwara

Chih-Yu Lin

Yen-Huei Chen

Hsien-Yu Pan

Yi-Hsin Nien

Haruki Mori

Ru-Yu Wang

Yu-Der Chih

Yi-Chun Shih

Chia-Fu Lee

Hiroki Noguchi

Po-Hao Lee

Yen-huei Chen

A circuit includes a data register configured to receive and output successive data elements of a plurality of data elements responsive to a clock signal, wherein each data element of the plurality of data elements includes a total number of bits N. A signal generation portion is configured to output a first selection signal responsive to the clock signal, the first selection signal includes two alternating sequences, values of the first sequence increment from zero to N−1, and values of the second sequence decrement from N−1 to zero. A selection circuit coupled to the data register is configured to output the N bits of each data element of the plurality of data elements in a first sequential order responsive to the first sequence of the first selection signal, and in a second sequential order opposite the first sequential order responsive to the second sequence of the first selection signal.

Data sequencing circuit and method

A memory device includes a first bit cell, a second bit cell, a first word line and a second word line. A first boundary of the second bit cell is adjacent with a first boundary of the first bit cell. The first word line is coupled to the first bit cell. The second word line is coupled to the second bit cell. A first segment of the first word line is overlapped with the first boundary of the second bit cell in a plan view, and a first segment of the second word line is overlapped with a second boundary of the second bit cell in the plan view.

Memory device

A memory device includes a first word line and a second word line. A first portion of the first word line is formed in a first metal layer, a second portion of the first word line is formed in a second metal layer above the first metal layer, and a third portion of the first word line is formed in a third metal layer below the second metal layer. A first portion of the second word line is formed in the first metal layer. A second portion of the second word line is formed in the second metal layer. The first portion, the second portion, and the third portion of the first word line have sizes that are different from each other, and the first portion and the second portion of the second word line have sizes that are different from each other.

Memory device including a word line with portions with different sizes in different metal layers

A compute-in-memory (CIM) device has a memory array with a plurality of memory cells arranged in rows and columns. The plurality of memory cells includes a first memory cell in a first row and a first column of the memory array and a second memory cell in the first row and a second column of the memory array. The first and second memory cells are configured to store respective first and second weight signals. An input driver provides a plurality of input signals. A first logic circuit is coupled to the first memory cell to provide a first output signal based on a first input signal from the input driver and the first weight signal. A second logic circuit is coupled to the second memory cell to provide a second output signal based on a second input signal from the input driver and the second weight signal.

Compute in memory

A memory device includes active regions and gate structures, each of the gate structures is electrically coupled to a first portion of a corresponding active region of the active regions. The memory device includes contact-to-transistor-component structures (MD structures), each of the MD structures is over a second portion of a corresponding active region, and a first MD structure is between adjacent gate structures. The memory device includes via-to-gate/MD (VGD) structures, each of the VGD structures is over to a corresponding gate electrode and MD structure. The memory device includes conductive segments, each of the conductive segments is over and electrically coupled to a corresponding VGD structure. The memory device includes buried contact-to-transistor-component structures (BVD) structures, each of the BVD structures is under a third portion of a corresponding active region. The memory device includes buried conductive segments, each of the buried conductive segments is under a corresponding BVD structure.

Four CPP wide memory cell with buried power grid, and method of fabricating same

A memory cell includes a write port and a read port. The write port includes two cross-coupled inverters that form a storage unit. The cross-coupled inverters are connected between a first power source signal line and a second power source signal line. The write port also includes a first local interconnect line in an interconnect layer that is connected to the second power source signal line. The read port includes a transistor that is connected to the storage unit in the write port and to the second power source signal line, and a second local interconnect line in the interconnect layer that is connected to the second power source signal line. The second local interconnect line in the read port is separate from the first local interconnect line in the write port.

Method and system to balance ground bounce

A memory device has a memory array of a plurality of memory cells arranged in a plurality of columns and a plurality of rows. The memory cells in each of the plurality of columns include first memory cells and second memory cells alternately arranged along a column direction of the plurality of columns. A first computation circuit is coupled to the first memory cells in each of the plurality of columns, and is configured to generate first output data corresponding to a first computation performed on first weight data stored in the first memory cells. A second computation circuit is coupled to the second memory cells in each of the plurality of columns, and is configured to generate second output data corresponding to a second computation performed on second weight data stored in the second memory cells.

Memory device and method for computing-in-memory (CIM)

A memory device and an operating method for computing-in-memory (CIM) are provided. The memory device for CIM comprises a plurality of memory banks and a global multiply accumulate (MAC) circuit. Each of the memory banks comprises a first memory array, a first latch circuit, a second latch circuit and a local MAC circuit. The first latch circuit latches a first data from the first memory array in a first read cycle. The second latch circuit latches a second data from the first memory array in a second read cycle. The local MAC circuit performs a first stage CIM operation on a first latched data latched in the first latch circuit and the second latched data latched in the second latch circuit to provide a first stage CIM result. The global MAC circuit performs a second stage CIM operation on a plurality of first stage CIM results from the memory banks.

Memory device and operating method for computing-in-memory

A circuit includes a data register configured to receive a signal including a plurality of data elements, a first selection circuit coupled to the data register, a counter, a second selection circuit coupled to the counter, and an inverter coupled between the counter and the second selection circuit. The data register outputs a plurality of bits of each data element to the first selection circuit, the counter and the inverter generate complementary signals in which sequential data elements have cyclical values that step in opposite directions, the second selection circuit alternatively outputs each of the complementary signals as a selection signal to the first selection circuit, and the first selection circuit, responsive to the selection signal, outputs the pluralities of bits of the data elements in alternating sequential orders.

A memory device is disclosed. The memory device includes a first program line and a second program line. A first portion of the first program line is formed in a first conductive layer, and a second portion of the first program line is formed in a second conductive layer above the first conductive layer. A first portion of the second program line is formed in the first conductive layer, and a second portion of the second program line is formed in a third conductive layer above the second conductive layer. A width of at least one of the second portion of the first program line or the second portion of the second program line is different from a width of at least one of the first portion of the first program line or the first portion of the second program line. A method is also disclosed herein.

A semiconductor chip is provided. The semiconductor chip includes a SRAM cell, a logic cell, a signal line and a ground line. The SRAM cell includes a storage transmission gate, a read transmission gate and a latch circuit. The latch circuit is serially connected between the storage and read transmission gates, and includes a first inverter, a second inverter and a transmission gate connected to an output of the first inverter, an input of the second inverter and an output of the storage transmission gate. The logic cell disposed aside the SRAM cell is connected with the SRAM cell by first and second active structures. The signal and ground lines extend at opposite sides of the SRAM and logic cells, and are substantially parallel with the first and second active structures. The SRAM and logic cells are disposed between and electrically connected to the signal and ground lines.

Semiconductor chip having memory and logic cells

A memory device including: active regions; gate electrodes which are substantially aligned relative to four corresponding track lines such that the memory device has a width of four contacted poly pitch (4 CPP) and are electrically coupled to the active regions; contact-to-transistor-component structures (MD structures) which are electrically coupled to the active regions, and are interspersed among corresponding ones of the gate electrodes; via-to-gate/MD (VGD) structures which are electrically coupled to the gate electrodes and the MD structures; conductive segments which are in a first layer of metallization (M_1st layer), and are electrically coupled to the VGD structures; buried contact-to-transistor-component structures (BVD structures) which are electrically coupled to the active regions; and buried conductive segments which are in a first buried layer of metallization (BM_1st layer), and are electrically coupled to the BVD structures, and correspondingly provide a first reference voltage or a second reference voltage.

A memory device includes a first program line and a second program line. A first portion of the first program line is formed in a first conductive layer, and a second portion of the first program line is formed in a second conductive layer above the first conductive layer. A first portion of the second program line is formed in the first conductive layer. A second portion of the second program line is formed in the second conductive layer. A third portion of the second program line is formed in a third conductive layer above the second conductive layer. The first portion and the second portion of the first program line have sizes that are different from each other, and the first portion, the second portion and the third portion of the second program line have sizes that are different from each other.

A memory macro system may be provided. The memory macro system may comprise a first segment, a second segment, a first WL, and a second WL. The first segment may comprise a first plurality of memory cells. The second segment may comprise a second plurality of memory cells. The first segment may be positioned over the second segment. The first WL may correspond to the first segment and the second WL may correspond to the second segment. The first WL and the second WL may be configured to be activated in one cycle.

Growing community of inventors

Hsinchu, Taiwan

Wei-Chang Zhao