Applied Materials, Inc.

Wayne French

Mark Joseph Saly

Kelvin Chan

Anantha K Subramani

Lakmal Charidu Kalutarage

Farzad Houshmand

Some embodiments include a method of depositing a photoresist onto a substrate in a processing chamber. In an embodiment, the method comprises flowing an oxidant into the processing chamber through a first path in a showerhead, and flowing an organometallic into the processing chamber through a second path in the showerhead. In an embodiment, the first path is isolated from the second path so that the oxidant and the organometallic do not mix within the showerhead. In an embodiment, the method further comprises that the oxidant and the organometallic react in the processing chamber to deposit the photoresist on the substrate.

Growing community of inventors

San Jose, CA, United States of America

Wayne French