Canon Kabushiki Kaisha

Wataru Yamaguchi

Takahiro Matsumoto

Hideki Ina

Ryo Sasaki

Hironobu Fujishima

Ryota Makino

A measuring device for measuring a position of a pattern includes a wavelength variable unit configured to vary a spectrum of first light in accordance with an incident position at which the first light is incident to allow the first light to pass therethrough, and a moving unit configured to change the incident position by moving the wavelength variable unit. The wavelength variable unit is moved to a position based on wavelength characteristic information and intensity characteristic information, the wavelength characteristic information indicating a relationship between the position of the wavelength variable unit and a wavelength of the first light transmitted through the wavelength variable unit, the intensity characteristic information indicating a relationship between the position of the wavelength variable unit and an intensity of second light from the pattern illuminated with the first light transmitted through the wavelength variable unit.

Measuring device, measuring method, substrate processing apparatus, and method of manufacturing product

The present invention provides a measurement apparatus for measuring a position of a first pattern and a position of a second pattern provided in a target object, the apparatus including an image capturing unit including a plurality of pixels which detect light from the first pattern and light from the second pattern, and configured to form an image capturing region used to capture the first pattern and the second pattern by the plurality of pixels, and a control unit configured to adjust the image capturing unit such that a relative ratio of an intensity of a detection signal of the first pattern generated based on an output from a first image capturing region and an intensity of a detection signal of the second pattern generated based on an output from a second image capturing region falls within an allowable range.

Measurement apparatus, lithography apparatus and article manufacturing method

A calibration method of a detection system including an illumination system configured to illuminate a detection target, and an imaging system configured to form an image of light from the detection target on a photoelectric conversion element, the method including obtaining, for each of at least two combinations of first apertures in the illumination system and second apertures in the imaging system, each of which is formed by selecting one first aperture and one second aperture from the plurality of first apertures and the plurality of second apertures, a defocus characteristic indicating a shift amount of the image on the photoelectric conversion element with respect to a defocus amount of the detection target in a state in which each of the first aperture and the second aperture is positioned in a first position shifted from a reference position.

Calibration method, detection system, exposure apparatus, article manufacturing method, and non-transitory computer-readable storage medium

A method of determining a position of a mark including a first pattern arranged in a first layer of a substrate and a second pattern arranged in a second layer of the substrate, includes determining information concerning the position of the mark as provisional position information based on an image of the mark, acquiring relative position information indicating a relative position between the first pattern and the second pattern, and determining the position of the mark based on the provisional position information and the relative position information.

Method of determining position of mark, lithography method, exposure apparatus, and article manufacturing method

A measurement apparatus including an illumination system configured to illuminate a target with light including light of a first wavelength and light of a second wavelength, a wavefront changing unit configured to change a wavefront aberration in light from the target, and a control unit configured to control the wavefront changing unit, wherein the wavefront changing unit includes a first region where the light of the first wavelength enters, and a second region where the light of the second wavelength enters, and the control unit controls the wavefront changing unit such that a first correction wavefront for correcting a first wavefront aberration in the light of the first wavelength is generated in the first region, and a second correction wavefront for correcting a second wavefront aberration in the light of the second wavelength is generated in the second region.

Measurement apparatus, measurement method, lithography apparatus and article manufacturing method

A detection apparatus for detecting a plurality of marks arranged on a substrate is provided. The apparatus includes a stage which supports the substrate, a plurality of detectors arranged apart from each other and configured to detect different marks of the plurality of marks arranged on the substrate, and a processor. For each of predetermined combinations of the detectors, the processor inclines a reference member supported by the stage at an inclination according to information on a position of a detection region and a focal position of each detector, and aligns a reference mark arranged on the reference member with each detector, and the processor obtains a measurement offset value of each of the plurality of detectors based on measurement values each acquired by the alignment performed for each of the plurality of predetermined combinations.

Detection apparatus, exposure apparatus, and article manufacturing method

An interferometer includes: an optical system configured to generate interfering light by dividing light from a light source, and combining reference light and measurement light; a detector configured to detect the interfering light generated by the optical system; and an optical member configured to give spatial coherence to the light from the light source before the detector detects the light from the light source. The optical member gives higher spatial coherence in a second direction serving as a direction of a line of intersection of a cross section of a beam of the light incident on the optical member, and a plane including optical paths of the light from the light source before being divided by the optical system, the reference light, the measurement light, and the interfering light, than in a first direction perpendicular to the plane.

Interferometer, lithography apparatus, and method of manufacturing article

An apparatus includes a system configured to split a light emitted from a light source into reference light and subject light, cause the subject light to enter into an object, and combine the subject light reflected by the object with the reference light, a detection unit configured to detect coherent light between the combined subject and reference lights, an element, provided within a light path of the reference light or the subject light, configured to change a path length difference between the reference light and the subject light and a relative position between the reference light and the subject light in a light receiving surface of the detection unit, and a position-variable mechanism configured to cause a position of the optical element to be changeable, wherein, by changing a position of the element, the optical path length difference and the relative position are independently adjusted.

Measuring apparatus and exposure device

The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, the apparatus including a stage configured to hold the substrate and to be moved, a charged particle optical system including a deflector configured to deflect the plurality of charged particle beams, a detector configured to detect a charged particle arrived thereat by causing a charged particle beam to impinge on a mark including a plurality of mark elements formed on one of the substrate and the stage, and a processor configured to perform a process of obtaining a position of the mark.

Drawing apparatus, and method of manufacturing article

A device has a scale on which a grating pattern is formed, a light source to irradiate light on the scale, a wavelength plate to transform multiple diffracted lights from the light source into circular polarized light, respectively, an optical element to superposition and cause interference of the multiple diffracted lights, and a photodetector to receive the interfered light. Also, a generating unit to generate linearly polarized light by the light from the light source, so that the multiple diffracted lights input to the wavelength plate become linearly polarized light with a same mutual polarization direction.

Displacement measurement device, exposure apparatus, and working device

A drawing apparatus performs drawing on a substrate with a plurality of charged particle beams. The apparatus comprises a stage configured to hold the substrate and to be moved; a projection system configured to project the plurality of charged particle beams onto the substrate; a measurement device configured to detect a charged particle beam that reaches the measurement device due to a charged particle beam incident, via the projection system, on a mark formed on the substrate, to measure a position of the mark; and a controller. The controller is configured to control operations of the projection system and the measurement device so that the position of the mark is measured with at least one of the plurality of charged particle beams, in parallel with drawing on the substrate with a part of the plurality of charged particle beams.

Drawing apparatus and method of manufacturing article

A surface shape measuring apparatus includes an illumination system and a light receiving system. The illumination system splits wide-band light from a light source into measurement light and reference light, illuminates the measurement light to obliquely enter a surface of the film, and illuminates the reference light to obliquely enter a reference mirror. The light receiving system combines the measurement light reflected by the surface of the film and the reference light reflected by the reference mirror with each other and introduces the combined light to a photoelectric conversion element. An incident angle of the measurement light upon the surface of the film and an incident angle of the reference light upon the reference mirror are each larger than the Brewster's angle. S-polarized light and p-polarized light included in the measurement light entering a surface of the substrate have equal intensity on the photoelectric conversion element.

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Utsunomiya, Japan

Wataru Yamaguchi