Tokyo Electron Limited

Wataru Tsukinoki

Yuichi Yamamoto

Akihiro Teramoto

Hiromi Hara

Takafumi Tsuchiya

Shuhei Goto

A substrate processing system includes a carry-in/out unit in which a cassette accommodating therein multiple substrates is carried in and out; a batch processing unit configured to process a lot including the multiple substrates at once; a single-wafer processing unit configured to process the substrates one by one; a first interface unit configured to distribute the substrates to the single-wafer processing unit or the batch processing unit; and a second interface unit configured to transfer the substrates between the batch processing unit and the single-wafer processing unit. The first interface unit includes a first placement unit configured to place therein the substrates before and after being processed by the single-wafer processing unit; a second placement unit configured to place therein the substrates before being processed by the batch processing unit; and a transfer device configured to transfer the substrates to the first placement unit and the second placement unit.

Substrate processing system, substrate processing method, and recording medium

Provided is a substrate processing system including a group controller which determines a combination of processing apparatuses having the shortest total processing time including the processing end time in a final processing apparatus, determines a predictable elapsed time up to a processing start time by a predetermined downstream processing apparatus for a wafer lot from a processing end time of the wafer lot by a predetermined processing apparatus in the combination of the processing apparatuses, and determines a timing of discharging the substrate to the predetermined processing apparatus or an upstream processing apparatus of the predetermined processing apparatus so that the predictable elapsed time is set within a predetermined time when the predictable elapsed time exceeds the predetermined time.

Substrate processing system and substrate processing method

After a cassette is mounted on a cassette mounting part, a control unit instructs a substrate treatment apparatus to start treatment on substrates in the cassette. Thereafter, the control unit indicates, to the substrate treatment apparatus, a cassette on the cassette mounting part to which a substrate is transferred at completion of the treatment. If the transfer destination cassette for the substrate at the completion of treatment has not been indicated when a number of remaining treatment steps for the substrate reaches a predetermined set number, an alarm is given from the substrate treatment apparatus. This alarm is sent from the substrate treatment apparatus to the control unit, and the control unit indicates a transfer destination cassette for the substrate.

Substrate treatment method and substrate treatment system

A coating and developing apparatus includes: a delivery mounting unit on which a carrier housing a plurality of substrates is to be mounted and the carrier being accessed by a delivery mechanism; a plurality of retreat mounting units on which the carriers are to be mounted; a carrier carry mechanism moving and mounting the carriers between the retreat mounting units and the delivery mounting unit; a collection schedule creating function determining a collection order for collecting the substrates placed in modules into original carriers in which the substrates were housed, when a trouble occurs; and a carry control unit controlling to carry the substrates to the carriers in which the substrates were housed according to the determined collection order.

Coating and developing apparatus

The invention controls a carrier moving and mounting device such that at normal time, the device moves and mounts carriers in sequence to a delivery mounting units according to a carry-in order, and when a priority carrier is carried into the carry-in mounting unit and if all of the delivery mounting units are occupied by the carriers, the device moves and mounts one of the carriers on the retreat mounting unit, and mounts the priority carrier on the delivery mounting unit which has become vacant by the movement; and controls a delivery device such that at normal time, the delivery device carries the substrates out of the carriers according to the carry-in order of the carriers mounted on the delivery mounting units, and when the priority carrier is mounted, the delivery device carries out the substrates in the priority carrier before the substrates in the other carriers.

Substrate treatment apparatus

A substrate treatment apparatus is disclosed. The substrate treatment apparatus includes: a cassette loading portion on which a cassette for containing a substrate is loaded when the cassette is carried to/from outside of the substrate treatment apparatus; a substrate treatment portion for performing a treatment on the substrate; a substrate carrying portion for carrying the substrate in the cassette loaded on the cassette loading portion to the substrate treatment portion, and carrying the substrate that has been subjected to the treatment by the substrate treatment portion to the cassette on the cassette loading portion; a vacant cassette loading portion on which the cassette caused to be vacant by carrying the substrate to the substrate treatment portion is temporarily loaded; and a vacant cassette transfer mechanism for transferring the vacant cassette between the vacant cassette loading portion and the cassette loading portion.

Growing community of inventors

Koshi, Japan

Wataru Tsukinoki