Denka Company Limited

Wataru Nishino

Yuhei Ishigaki

Suguru Onuki

Shogo Hagiwara

Uichiro Yamagishi

Naoki Kobayashi

Kosuke Fujimoto

Yutaka Saito

Takashi Aizawa

Yushi Kumagai

Atsunori Kondo

Misaki Tada

Seiya Tomizawa

Ibuki Shimotomai

Hideharu Mori

A chloroprene-based block copolymer, a latex, a latex composition, and a rubber composition that can produce a product with excellent flexibility and tensile properties without the use of a vulcanizing agent or a vulcanizing accelerator. A chloroprene-based block copolymer, includes 5 to 30% by mass of a polymer block (A) and 70 to 95% by mass of a chloroprene-based polymer block (B), wherein: the polymer block (A) is derived from a monomer; when the monomer is polymerized alone, a polymer with a glass transition temperature of 80° C. or higher can be obtained; the chloroprene-based polymer block (B) includes a chloroprene monomer; and the chloroprene-based block copolymer has a toluene insoluble content of 20 to 100% by mass with respect to 100% by mass of the chloroprene-based block copolymer.

Chloroprene-based block copolymer, latex, latex composition, and rubber composition

A chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, in which the chloroprene-unsaturated nitrile copolymer has a peak at 5.80 to 6.00 ppm in a 1H-NMR spectrum as measured in a deuterochloroform solvent, and a ratio (A/B) of a peak area (A) at 5.80 to 6.00 ppm and a peak area (B) at 4.05 to 6.20 ppm is 0.6/100 to 1.1/100.

Chloroprene/unsaturated nitrile copolymer, chloroprene/unsaturated nitrile copolymer composition and vulcanized molded article

A chloroprene-unsaturated nitrile copolymer composition containing 100 parts by mass of a chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, and 0.05 to 2.0 parts by mass of a xanthogen compound.

Chloroprene/unsaturated nitrile copolymer composition and vulcanized molded object

To provide a statistical copolymer containing a chloroprene monomer unit and an unsaturated nitrile monomer unit which has a satisfactory oil resistance. A method for producing a statistical copolymer containing a chloroprene monomer unit and an unsaturated nitrile monomer unit includes a step for conducting continuous addition or 10 cycles or more of intermittent portionwise addition of the chloroprene monomer after initiation of a polymerization reaction is provided. A rubber composition using a statistical copolymer according to the invention or a vulcanized molded article containing the rubber composition is excellent in terms of oil resistance, mechanical strength, compression set at a low temperature and flex fatigue resistance.

Method for producing statistical copolymer containing chloroprene monomer unit and unsaturated nitrile monomer unit, statistical copolymer, latex and use of same

To provide a block copolymer that includes an aromatic vinyl compound polymer and a chloroprene polymer, has a number average molecular weight of 100,000 or more, is preferred for a rubber composition and an adhesive composition, and is suitable for industrial production. A block copolymer includes at least one aromatic vinyl compound polymer block and at least one chloroprene polymer block, has a functional group with a structure represented by Chemical Formula (1) or (2), and has a number average molecular weight of 100,000 or more. The chloroprene polymer block has a number average molecular weight of 80,000 or more in total. (In Chemical Formula (1), Ris hydrogen, chlorine, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclyl group.)

Block copolymer and method for producing block copolymer

Provided is a chloroprene-based polymer having an industrially applicable sufficient molecular weight and capable of obtaining a vulcanized rubber excellent in durability and fatigue endurance and an adhesive excellent in layer separation resistance. A chloroprene-based polymer having a number average molecular weight Mn of 150000 to 300000 and comprising a functional group of a structure represented by the general formula (1) or (2) below: (wherein in the general formula (1), R1 shows hydrogen, chlorine, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclyl group.)

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Itoigawa, Japan

Wataru Nishino