Fuji Corporation

Wataru Kusaka

Takahiro Jindo

Shinji Takikawa

Akihiro Higashida

A plasma generation device including an electric power supply device to supply electric power to multiple electrodes arranged in a reaction chamber; a processing gas supply device to supply a processing gas to the reaction chamber; and a control device to control operation of the electric power supply device and the processing gas supply device in either of a first operation mode in which, when a stop signal is received while electric power is being supplied to the electrodes in a state with the processing gas being supplied to the reaction chamber, supply of electric power to the electrodes is stopped and supply of the processing gas to the reaction chamber is stopped, and a second operation mode in which supply of electric power to the electrodes is stopped, but the processing gas continues to be supplied to the reaction chamber.

Plasma generation device

A plasma-generating device capable of detecting a short circuit or electrical discharge of a cable. In response to a detection voltage detected by a current transformer becoming equal to or greater than a threshold voltage, a touchscreen panel of the plasma-generating device reports a current abnormality. When a short circuit or a discharge occurs between the first cable and the second cable, which are a pair of cables, an induced current flows through the shield member by electromagnetic induction. Therefore, the detector can detect a current abnormality due to a short circuit or electrical discharge between the first cable and the second cable.

Growing community of inventors

Okazaki, Japan

Wataru Kusaka