Byd Company Limited

Shenzhen Byd Auto R&d Company Limited

Southern University of Science and Technology

Wang Zhang

Hongpo Hu

Chunlin Xie

Xilin Su

Guobiao Zhang

Qiang Wang

Hongyu Yu

Yuejin Guo

Shengming Zhou

Guoxing Zhang

Guangzhao Liu

Mingtao Hu

Yida Li

Xiaodong Xiang

Mei Shen

Wanshi Chen

Dongming Huo

Jihang Qi

A three-dimensional (3-D) module with integrated passive components includes a plurality of vertically stacked sub-modules. Each sub-module comprises a device level comprising a high-k dielectric (e.g. ceramic) material and an interconnect level comprising a low-k dielectric (e.g. organic) material. The passive components in the device level are fired integrally, whereas the device level and the interconnect level are fired independently.

Three-dimensional module with integrated passive components

The present invention discloses a multi-bit-per-cell three-dimensional resistive random-access memory (3D-RRAM). It comprises a plurality of RRAM cells stacked above a semiconductor substrate. Each RRAM cell comprises a RRAM layer, which is switched from a high-resistance state to a low-resistance state during programming. By adjusting the programming current, the programmed RRAMs have different resistances.

Multi-bit-per-cell three-dimensional resistive random-access memory (3D-RRAM)

A method of forming a current diffusion layer is provided that comprises providing an epitaxial wafer. The method further comprises depositing ITO source material on the epitaxial wafer to form a base ITO layer by a direct current electron gun and depositing ZnO source material, during simultaneous deposition of the ITO source material, on the base ITO layer to form a ZnO doped ITO layer by a pulse current electron gun. The ZnO source material is deposited at a deposition rate higher than the rate at which the ITO source material is deposited. Generation and termination of current may be controlled by adjusting a duty cycle of pulse current provided by the pulse current electron gun and result in discontinuous deposition of the ZnO source material. The method further comprises depositing the ITO source material on the ZnO doped ITO layer to cover the ZnO doped ITO layer and form a finished ITO layer.

Method for forming current diffusion layer in light emitting diode device and method for fabricating the same

An epitaxial wafer for a light emitting diode (LED) and a method for manufacturing the same are provided. The method comprises: providing a substrate; forming a first LED epitaxial structure on a first surface of the substrate, in which the first LED epitaxial structure comprises a first n-type semiconductor layer, a first light emitting layer, a first anti-diffusion layer between the first n-type semiconductor layer and the first light emitting layer, a first p-type semiconductor layer, and a second anti-diffusion layer between the first p-type semiconductor layer and the first light emitting layer; and forming a second LED epitaxial structure on a second surface of the substrate. An LED chip comprising the epitaxial wafer and a method for manufacturing the same are also provided.

Epitaxial wafer for light emitting diode, light emitting diode chip and methods for manufacturing the same

A light emitting diode (LED) structure, a LED device and methods for forming the same are provided. The LED structure comprises a LED wafer; and a phosphor layer having a flat surface and formed above a light emitting surface of the LED wafer, in which the phosphor layer is formed by centrifugal spin coating.

LED structure, LED device and methods for forming the same

A method for manufacturing an epitaxial wafer for a light emitting diode (LED) is provided. The method may comprise: forming a back coating layer on a back surface of a substrate; forming a buffer layer on a top surface of the substrate; forming an N-type semiconductor layer on the buffer layer; forming a multi-quantum well layer on the N-type semiconductor layer; and forming a P-type semiconductor layer on the multi-quantum well layer. An epitaxial wafer and a method for manufacturing an LED chip are also provided.

Epitaxiay wafer, method for manufacturing the same and method for manufacturing LED chip

A groove structure formed on a surface of a substrate. The groove structure includes a lateral epitaxial pattern in a cross section perpendicular to the surface, which has: a first edge inclined to the surface; a second edge adjacent to first edge and parallel to the surface; a third edge parallel to the first edge, having a projection on the surface covering the second edge; and a fourth edge adjacent to the third edge. A first intersection between the second edge and the third edge on the second edge and an injection of a second intersection between the third edge and the fourth edge on the second edge are located on two sides of a third intersection between the first edge and the second edge, or the injection of the second intersection between the third edge and the fourth edge on the second edge coincides with the third intersection.

Substrate structure, method of forming the substrate structure and chip comprising the substrate structure

A semiconductor device comprises a substrate; a conductive layer deposited on a substrate, the conductive layer being patterned to include a first pattern, the first pattern including a major surface and a plurality of grids defined in the major surface, the major surface including first lines and a connecting portion, wherein the connecting portion is connected to an electrode; and an epitaxial layer disposed on the conductive layer, covering the grids and the first line between the adjacent grids.

Epitaxial wafer and manufacturing method thereof

A light emitting diode includes a substrate comprising a plurality of first grooves and a plurality of first convex parts formed on a surface of the substrate, with the first groove formed between two neighboring first convex parts; a semiconductor structure formed on the substrate comprising a plurality of second convex parts corresponding to the plurality of first grooves and a plurality of second grooves corresponding to the plurality of first convex parts; a transparent conductive layer formed on the semiconductor structure and configured to transmit a current to the plurality of second convex parts; a first electrode electrically connected with the semiconductor structure; and a second electrode electrically connected with the transparent conductive layer. A method for preparing the light emitting diode is also provided.

Light emitting diode and method for preparing the same

A semiconductor device comprises a substrate, a conductive layer deposited on a substrate and an epitaxial layer deposited on the conductive layer. The conductive layer is patterned to include a first pattern. The first pattern includes a major surface and a plurality of grids defined in the major surface. The major surface includes a plurality of first lines and a connecting portion. The connecting portion is connected to an electrode. The epitaxial layer covers the grids and the first lines between the adjacent grids.

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Shenzhen, China

Wang Zhang