Taiwan Semiconductor Manufacturing Comp. Ltd.

Wang Chun-Chieh

Huai-Tei Yang

Yueh-Ching Pai

Chien-Shun Liao

Chun-I Wu

An embodiment is a method of semiconductor processing. The method includes depositing a high-k gate dielectric layer over a semiconductor fin. A barrier layer is deposited over the high-k gate dielectric layer. A silicon passivation layer is deposited over the barrier layer. A nitrogen treatment is performed on the silicon passivation layer. A capping layer is deposited over the silicon passivation layer. The capping layer is annealed.

Growing community of inventors

Kaohsiung, Taiwan

Wang Chun-Chieh