Samsung Electronics Co., Ltd.

Wandon Kim

Jeonghyuk Yim

Jin Yong Kim

Sunghwan Kim

Jongho Park

Geunwoo Kim

Sangjin Hyun

Byounghoon Lee

Hyunbae Lee

Yoon Tae Hwang

Heonbok Lee

Jaeyeol Song

Sunyoung Noh

Weonhong Kim

Eui Bok Lee

Musarrat Hasan

Yoontae Hwang

Donggon Yoo

Ohseong Kwon

Hyeonjun Baek

Seungkeun Cha

Sunjung Lee

Rakhwan Kim

Euibok Lee

Myung Gil Kang

Dong-Chan Lim

Taegon Kim

Minwoo Song

Munhyeon Kim

Kyuho Cho

Jonghan Lee

HyungSuk Jung

Hanki Lee

Suyoung Bae

Namgyu Cho

Jinkyu Jang

Minjoo Lee

HyeokJun Son

Dongsuk Shin

Boun Yoon

Hoonjoo Na

Beom Seok Kim

Yong-Suk Tak

Dongsoo Lee

Seung Hoon Choi

Jong Cheol Lee

Hyeok-Jun Son

Doyoung Choi

Seungseok Ha

Ki Chul Park

Bo Yun Kim

Jongchan Shin

Byung-Suk Jung

Hanmin Jang

Hyunwoo Kang

Jaewan Chang

Shinhye Kim

Beomseok Kim

Jaeung Koo

TaekSoo Jeon

Seowoo Nam

Yeryung Jeon

Hyoseok Choi

Kwansung Kim

Kyungbum Koo

Jaeseoung Park

Junki Park

A semiconductor device includes a substrate with an active region, a first interlayer insulating layer on the substrate, a first wiring in the first interlayer insulating layer that is electrically connected to the active region, an insulating pattern on the first interlayer insulating layer and that has a first opening exposing the first wiring, a double etch stop layer having lower and upper etch stop patterns on the insulating pattern and the first wiring, and including a second opening exposing a portion of the first wiring, a second interlayer insulating layer on the upper etch stop pattern and having a via hole connected to the second opening, the via hole having a rounded top corner region, a second wiring in the second interlayer insulating layer, and a via connecting the portion of the first wiring and the second wiring through the second opening and the via hole.

Semiconductor device with double etch stop layer and method of manufacturing the same

A semiconductor device includes a lower structure including a substrate, a first interconnection layer extending in a first direction on the lower structure, and including a first metal, a first via contacting a portion of an upper surface of the first interconnection layer and including a second metal, a second via contacting at least a portion of an upper surface of the first via and having a maximum width narrower than a maximum width of the first via, and a second interconnection layer connected to the second via and extending in a second direction. The first interconnection layer has inclined side surfaces in which a width of the first interconnection layer becomes narrower towards an upper region of the first interconnection layer, and the first via has inclined side surfaces in which a width of the first via becomes narrower towards an upper region of the first via.

Semiconductor devices

A semiconductor device includes; a substrate including an active pattern, a channel pattern and a source/drain pattern on the active pattern, wherein the channel pattern is connected to the source/drain pattern, a gate electrode on the channel pattern, and a gate contact connected to a top surface of the gate electrode, wherein the gate contact includes a capping layer directly contacting the top surface of the gate electrode and a metal layer on the capping layer, wherein the capping layer and the metal layer include the same metal, a concentration of oxygen in the metal layer ranges from between about 2 at % to about 10 at %, and a maximum concentration of oxygen in the capping layer ranges from between about 15 at % to about 30 at %.

Semiconductor device and method of fabricating the same

Disclosed is a semiconductor device including a substrate, a first interlayer dielectric layer on the substrate, a plurality of first vias in the first interlayer dielectric layer, a second interlayer dielectric layer on the first interlayer dielectric layer, and a first power line and a first lower line in the second interlayer dielectric layer that are electrically connected to respective ones of the first vias. A first width in a first direction of the first power line is greater than a second width in the first direction of the first lower line. The first power line includes a first metallic material. The first lower line includes a second metallic material. The first vias includes a third metallic material. The first, second, and third metallic materials are different from each other.

Semiconductor device

A semiconductor device includes a substrate including first and second regions, first and second active patterns provided on the first and second regions, respectively, a pair of first source/drain patterns on the first active pattern and a first channel pattern therebetween, a pair of second source/drain patterns on the second active pattern and a second channel pattern therebetween, first and second gate electrodes respectively provided on the first and second channel patterns, and first and second gate insulating layers respectively interposed between the first and second channel patterns and the first and second gate electrodes. Each of the first and second gate insulating layers includes an interface layer and a first high-k dielectric layer thereon, and the first gate insulating layer further includes a second high-k dielectric layer on the first high-k dielectric layer.

Semiconductor device and method of manufacturing the same

A semiconductor device includes a front-end-of-line (FEOL) layer, which includes a plurality of individual devices, on a substrate, and first, second, and third metal layers sequentially stacked on the FEOL layer. The second metal layer includes an interlayer insulating layer and an interconnection line in the interlayer insulating layer. The interconnection line includes a lower via portion electrically connected to the first metal layer, an upper via portion electrically connected to the third metal layer, and a line portion between the lower via portion and the upper via portion. A line width of an upper portion of the interconnection line gradually decreases in a vertical direction away from the substrate, and a line width of a lower portion of the interconnection line gradually increases in a vertical direction away from the substrate.

An integrated circuit (IC) device includes a conductive region including a first metal on a substrate. An insulating film is on the conductive region. A conductive plug including a second metal passes through the insulating film and extends in a vertical direction. A conductive barrier pattern is between the conductive region and the conductive plug. The conductive barrier pattern has a first surface in contact with the conductive region and a second surface in contact with the conductive plug. A bottom surface and a lower sidewall of the conductive plug are in contact with the conductive barrier pattern, and an upper sidewall of the conductive plug is in contact with the insulating film. The conductive barrier pattern includes a vertical barrier portion between the insulating film and the conductive plug, and the vertical barrier portion has a width tapering along a first direction away from the conductive region.

Integrated circuit device

A semiconductor device including transistors on a substrate, a first interlayer insulating layer on the transistors, a first lower interconnection line and a second lower interconnection line in an upper portion of the first interlayer insulating layer, a dielectric layer being selectively on a top surface of the first interlayer insulating layer except top surfaces of the first and second lower interconnection lines, an etch stop layer on the first and second lower interconnection lines and the dielectric layer, a second interlayer insulating layer on the etch stop layer, and an upper interconnection line in the second interlayer insulating layer may be provided.

Disclosed are a semiconductor device and a method of fabricating the same. The device may include a substrate, an active pattern in an upper portion of the substrate and is extending in a first direction, a gate electrode crossing the active pattern and extending in a second direction intersecting the first direction, a first gate spacer covering a side surface of the gate electrode, a first inhibition layer between the gate electrode and the first gate spacer, and a gate insulating layer between the gate electrode and the active pattern. The gate insulating layer may include a high-k dielectric layer and a gate oxide layer. The gate oxide layer may be between the high-k dielectric layer and the active pattern. The high-k dielectric layer may be between the gate oxide layer and the gate electrode.

Semiconductor device and method of fabricating the same where semiconductor device includes high-k dielectric layer that does not extend between inhibition layer and side of gate electrode

A semiconductor device includes a first and second channel patterns on a substrate, each of the first and second channel patterns including vertically-stacked semiconductor patterns; a first source/drain pattern connected to the first channel pattern; a second source/drain pattern connected to the second channel pattern, the first and second source/drain patterns having different conductivity types; a first contact plug inserted in the first source/drain pattern, and a second contact plug inserted in the second source/drain pattern; a first interface layer interposed between the first source/drain pattern and the first contact plug; and a second interface layer interposed between the second source/drain pattern and the second contact plug, the first and second interface layers including different metallic elements from each other, a bottom portion of the second interface layer being positioned at a level that is lower than a bottom surface of a topmost one of the semiconductor patterns.

A semiconductor device includes a plurality of semiconductor patterns that are sequentially stacked and spaced apart from each other on a substrate, and a gate electrode on the plurality of semiconductor patterns. The gate electrode includes a capping pattern and a work function pattern that are sequentially stacked on the plurality of semiconductor patterns. The capping pattern includes a first metal nitride layer including a first metal element, and a second metal nitride layer including a second metal element whose work function is greater than a work function of the first metal element. The first metal nitride layer is disposed between the second metal nitride layer and the plurality of semiconductor patterns. The first metal nitride layer is thinner than the second metal nitride layer.

A semiconductor device includes first and second active patterns on first and second active regions of a substrate, respectively, a pair of first source/drain patterns and a first channel pattern therebetween which are in an upper portion of the first active pattern, a pair of second source/drain patterns and a second channel pattern therebetween which are in an upper portion of the second active pattern, and first and second gate electrodes intersecting the first and second channel patterns, respectively. Each of the first and second gate electrodes includes a first metal pattern adjacent to a corresponding one of the first and second channel patterns. The first and second channel patterns include SiGe. A Ge concentration of the second channel pattern is higher than a Ge concentration of the first channel pattern. A thickness of the first metal pattern of the second gate electrode is greater than a thickness of the first metal pattern of the first gate electrode.

An integrated circuit (IC) device includes a first conductive line in a closed curve defining a local area on a substrate. The first conductive line has a first end portion and a second end portion. A second conductive line is outside the local area. The second conductive line has a linear line portion along the closed curve and a bulging end portion along the closed curve. The bulging end portion protrudes from the linear line portion toward the first end portion of the first conductive line in the second lateral direction and protrudes further than the first end portion to the outside of the local area. A method of manufacturing an IC device includes forming a first reference pattern having a mandrel hole. A reference spacer is formed inside the mandrel hole. A second reference pattern is formed. The second reference pattern has a shift hole.

Integrated circuit device having parallel conductive lines with bulging end portion(s) and method of manufacturing the same

A semiconductor device includes: an active fin disposed on a substrate; a gate structure overlapping the active fin; source/drain regions disposed on both sides of the gate structure and on the active fin; and contact structures respectively connected to the source/drain regions, wherein the gate structure includes: a pair of gate spacers spaced apart from each other to provide a trench; a first gate electrode disposed in the trench and extending along an upper surface and a lateral surface of the active fin; a second gate electrode disposed on the first gate electrode in the trench, wherein the first gate electrode is not disposed between the second gate electrode and the pair of gate spacers; and a gate insulating film disposed between the pair of gate spacers and interposed between the first gate electrode and the active fin.

Semiconductor device including a gate structure

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Seongnam-si, South Korea

Wandon Kim