Texas Instruments Corporation

Other

Texas Tech University System

Wan S Wong

C Rinn Cleavelin

A Kathleen Hennessey

YouLing Lin

Rajasekar Reddy

Howard V Hastings, Ii

Youling Lin

Ramakrishna Pattikonda

Kwang-Soo Hahn

Pinar Kinokoglu

Pinar Kinikoglu

Stephen J Demoor

Ramachandra R Katragadda

A method and system for generating and managing a knowledgebase for use in identifying anomalies on a manufactured object, such as a semiconductor wafer, includes measures for adding, deleting, and organizing data from the knowledgebase.

System and method for classifying an anomaly

A system and method allow for associating a descriptive label with an anomaly on a manufactured object, such as a semiconductor wafer. The method includes placing the manufactured device on a moveable stage; capturing and preparing a digital-pixel-based representation of the image; symbolically decomposing the digital-pixel-based representation of the image to create a primitive-based representation of the image; analyzing the primitive-based representation of the image to detect and locate the anomaly; isolating primitives associated with the anomaly; comparing the isolated primitives associated with the anomaly with primitives in a knowledge base to locate a set of primitives in the knowledge base most like the isolated primitives associated with the anomaly; and assigning a label associated with the set of primitives in the knowledge base that was most similar to the isolated primitives associated with the anomaly. Different layers of semiconductor wafer may be analyzed to determine an appropriate label for a defect.

Method and system for identifying defects in a semiconductor

System and method for knowledgebase generation and management

A method is provided for aligning a silicon wafer (20) in a fabrication tool (37) having a stage (22) involving the steps of producing a digital image of a portion of wafer (20) in a scope-of-view window (48), converting the digital image to image primitives, comparing the image primitives to grammar template primitives to locate a known intersection on wafer (20); and moving the stage (22) to align wafer (20). A method and apparatus are disclosed for determining the misregistration of two layers of a wafer (20) by converting targets (158, 160) to primitives and determining the relative displacement in symbolic space. The misregistration apparatus involves a camera (34), a video-to-digital converter (32), a computer (28), and a stage adjuster (24).

Apparatus and method for aligning and measuring misregistration

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Dallas, TX, United States of America

Wan S Wong