Taiwan Semiconductor Manufacturing Comp. Ltd.

Wan-Chun Kuan

Yi-Wei Chiu

Tzu-Chan Weng

Chih-Teng Liao

Meng-Je Chuang

An integrated circuit structure includes a semiconductor substrate having a plurality of semiconductor strips, a first recess being formed by two adjacent semiconductor strips among the plurality of semiconductor strips, a second recess being formed within the first recess, and an isolation region being provided in the first recess and the second recess. The second recess has a lower depth than the first recess.

Method for forming recesses in a substrate by etching dummy fins

A chamber door, such as an etch chamber door may be heated during etch processing to, e.g., prevent etching by-products from adhering to the etch chamber door. Such heating of the etch chamber door, however, can impact the processing parameters and result in non-uniform processing, such as non-uniform etching characteristics across a semiconductor wafer, for instance. An insulator, such as an insulating film covering surfaces of the heated door, can reduce or eliminate transmission of heat from the door to a work piece such as a semiconductor wafer and this reduce or eliminate the non-uniformity of the process results.

Heat shield for chamber door and devices manufactured using same

Integrated circuit structure having a crown-shaped semiconductor strip and an isolation region recessed in the substrate

A method of manufacturing a semiconductor device includes forming a semiconductor strip protruding above a substrate, forming isolation regions on opposing sides of the semiconductor strip, recessing the isolation regions in a first chamber using a first etching process, and increasing a planarity of the isolation regions in the first chamber using a second etching process.

FinFET devices and methods of forming the same

Methods of forming recesses in substrates by etching dummy Fins

Integrated circuit structure having crown-shaped semiconductor strips and recesses in the substrate from etched dummy fins

Growing community of inventors

Chiayi, Taiwan

Wan-Chun Kuan