Asml Netherlands B.v.

Walter Theodorus Matheus Stals

Giovanni Luca Gattobigio

Erik Henricus Egidius Catharina Eummelen

Cornelius Maria Rops

Ronald Van Der Ham

Theodorus Wilhelmus Polet

Yuri Johannes Gabriël Van De Vijver

David Bessems

Günes Nakiboglu

Coen Hubertus Matheus Baltis

Jorge Alberto Vieyra Salas

Aleksandar Nikolov Zdravkov

Daan Daniel Johannes Antonius Van Sommeren

Harold Sebastiaan Buddenberg

Victor Manuel Blanco Carballo

Frederik Antonius Van Der Zanden

Wilhelmus Antonius Wernaart

Josephus Peter Van Lieshout

Johannes Cornelis Paulus Melman

Johannes Cornelius Paulus Melman

A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure COgas so as to provide a substantially pure COgas environment adjacent to, and radially outward of, the space.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, a lithographic apparatus and a method of operating a lithographic apparatus

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, lithographic apparatus and method of operating a lithographic apparatus

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Veldhoven, Netherlands

Walter Theodorus Matheus Stals