Hoechst Aktiengesellschaft

Hoechst Celanese Corporation

Clariant Corporation

Herberts Gmbh

Az Electronic Materials (germany) Gmbh

Walter Spiess

Georg Pawlowski

Horst Roeschert

Ralph R Dammel

Klaus-Juergen Przybilla

Gerhard Lohaus

Charlotte Eckes

Winfried Meier

Helmut Schmidt

Gerhard Buhr

Martin Mennig

Ping-Hung Lu

Michael Meier

Wolfgang Appel

Peter William Oliveira

Fumio Kita

Hans-Joachim Merrem

Juergen Fuchs

Ivan Cabrera

Andreas Gier

Stanley A Ficner

Anthony Canize

Geog Pawlowski

Horst Wengenroth

Walter Herr

The invention relates to a method for microstructuring electronic components, which yields high resolutions (&#x2266;200 nm) at a good aspect ratio while being significantly less expensive than photolithographic methods. The inventive method comprises the following steps: i) a planar unhardened sol film of a nanocomposite composition according to claimis produced; ii) a target substrate consisting of a bottom coat (b) and a support (c) is produced; iii) sol film material obtained in step i) is applied to the bottom coat (b) obtained in step ii) by means of a microstructured transfer embossing stamp; iv) the applied sol film material is hardened; v) the transfer embossing stamp is separated, whereby an embossed microstructure is obtained as a top coat (a). The method for producing a microstructured semiconductor material comprises the following additional steps: vi) the remaining layer of the nanocomposite sol film is plasma etched, preferably with CHF/Oplasma; vii) the bottom coat is plasma etched, preferably with Oplasma; viii) the semiconductor material is etched or the semiconductor material is doped in the etched areas.

Nanoimprint resist

A negative-working radiation-sensitive mixture containing

Negative-working radiation-sensitive mixture, and radiation-sensitive

Sulfonic acid esters, radiation-sensitive mixtures prepared therewith

A photosensitizer comprising a trishydroxyphenylethane 80/20 to 50/50 2,1,5-/2,1,4-diazonaphthoquinone sulfonate, and a trishydroxybenzophenone 0/100 to 20/80 2,1,5-/2,1,4-diazonaphthoquinone sulfate, and a photoresist composition containing such photosensitizer, the photosensitizer being present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; and a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition.

Positive photoresist composition comprising a mixed ester of

Positive-acting radiation-sensitive mixture and recording material

Sulfonic acid esters of 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine are disclosed. Also disclosed is a negative-working radiation-sensitive mixture containing such a compound in combination with a compound containing at least two acid-crosslinkable groups, and a water-insoluble polymeric binder which is soluble or at least swellable in aqueous alkaline solutions. The esters are esters of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10)alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl-(C.sub.1 -C.sub.10)alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n may be 1 or 2. The radiation-sensitive mixture according to the invention is remarkable for a high resolution and a high sensitivity over a wide spectral range and can be used to produce a radiation-sensitive recording material suitable for producing photoresists, electronic components, or printing plates, or for chemical milling.

Radiation-sensitive sulfonic acid esters and their use

A negative-working radiation-sensitive mixture which comprises

Negative-working radiation-sensitive mixture containing diazomethane

Negative-working radiation-sensitive mixture and radiation-sensitive

A positive-working radiation-sensitive mixture is disclosed that contains

Postive-working radiation-sensitive mixture and radiation-sensitive

Disclosed are compounds of the formula I ##STR1## in which X is a phenyl, [1]naphthyl or [2]naphthyl radical each substituted by at least one tert.-butoxycarbonyloxy group and, if appropriate, having one or more than one additional substituent,

Compounds with acid-labile protective groups useful in positive-working

A radiation-sensitive mixture which contains compounds of the formula I which generate under irradiation sulfonic acids and are cleavable by the latter ##STR1## in which R.sup.1 is an unsubstituted or substituted alkyl, fluorinated alkyl, perfluoroalkyl or aryl radical,

Acid-cleavable radiation-sensitive compounds, positive working

Ligomeric sulfonic acid derivatives having repeating units of the formula I ##STR1## in which R.sup.1 is an alkyl, haloalkyl or aryl radical,

Acid-cleavable radiation-sensitive compounds, radiation-sensitive

Sulfonic acid esters of 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine are disclosed. Also disclosed is a negative-working radiation-sensitive mixture containing such a compound in combination with a compound containing at least two acid-crosslinkable groups, and a water-insoluble polymeric binder which is soluble or at least swellable in aqueous alkaline solutions. The esters are esters of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10)-alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl-(C.sub.1 -C.sub.10)alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n may be 1 or 2. The radiation-sensitive mixture according to the invention is remarkable for a high resolution and a high sensitivity over a wide spectral range and can be used to produce a radiation-sensitive recording material suitable for producing photoresists, electronic components, or printing plates, or for chemical milling.

Compounds having repeating units of the formula I ##STR1## in which R.sup.1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH.sub.2 groups may be replaced by oxygen or sulfur atoms,

Acid-cleavable compounds, positive-working radiation-sensitive mixture

1-Sulfonyloxy-2-pyridones of the formula I ##STR1## show good radiation sensitivity over a wide spectral range and are therefore valuable as photoactive compounds in radiation-sensitive mixtures.

Growing community of inventors

Dieburg, Germany

Walter Spiess