E.i. Dupont De Nemours and Company

American Telephone and Telegraph, Co.

Walter R Hertler

Sheau-Hwa Ma

Robert Clayton Wheland

Gwendyline Y Chen

Ira B Dicker

Richard Douglas Bauer

Dotsevi Y Sogah

William Brown Farnham

Richard C Ebersole

Albert Gordon Anderson

John James Felten

Gary N Taylor

Howard E Simmons

Jeffrey Jude Patricia

Fritz P Boettcher

Yuan Yu Chen

Floyd A Raymond

Mario Grossa

Patrick H Fitzgerald

Howard Ensign Simmons, Iii

Robin Nikolas Greene

Dennis S Donald

Thomas W Del Pesco

Arthur C Shor

Evan D Laganis

Harry J Spineli

A process for preparing an aqueous dispersion by wet milling an aqueous carrier medium, a particulate solid, and a polymeric dispersant; wherein the polymeric dispersant is a combination of at least 50% by weight of a block copolymer; and a random copolymer; and wherein the block and random copolymers are prepared from substantially the same monomers. This invention provides an easy dispersion process for particulate solids, in particular colorants such as pigments or disperse dyes, at higher loadings, and a reduction of dispersion time which improves the productivity. Resulting dispersions have particular utility as inks for ink-jet printers.

Two component dispersant for wet milling process

The present invention relates to block copolymer dispersants comprising a hydrophobic block and a hydrophilic block having at least one polymerized monomer including a primary amine functionality. The inventive block copolymer dispersant is used to make aqueous dispersants such as inks that have enhanced paper binding characteristics.

Inks with enhanced substrate binding characteristics

A non-photoformable composition for use as the first unpatterned layer in a diffusion patterning process consisting essentially of: A. a film-forming solid organic polymer having no free acid groups containing a plurality of acid liable groups which are acid reactive; B. a plasticizer in which the solid organic polymer is incompletely soluble; C. volatile organic solvent, the ratio of polymer to plasticizer being such that when the volatile organic solvent is removed from the organic medium, the resulting solvent-free polymer/plasticizer dispersion is specularly nonreflective; and D. finely divided particles of dielectric solids.

Compositions for diffusion patterning

Aqueous ink jet ink compositions comprising an aqueous carrier medium, a colorant, such as a dye or a pigment, and a polyampholyte containing at least one carboxylic acid group and at least one amine group have improved dispersion stability and flexibility in manufacturing.

Aqueous ink jet inks

A method for preparing high resolution wash-off polyimide images is described having the sequential steps of (a) providing a non-photosensitive layer containing a substantially non-crystalline poly(amic acid) polymer or salt thereof on a substrate; (b) applying an aqueous ink imagewise to the non-photosensitive layer to change the solubility in the ink-applied areas, the aqueous ink containing a solubility altering agent; (c) washing the non-photosensitive layer with an aqueous solution to remove the soluble areas; and (d) converting the poly(amic acid) polymer to a polyimide.

Method for preparing high resolution polyimide images using

Aqueous dispersions having improved stability and which are particularly well suited for use as aqueous ink jet ink compositions comprise an aqueous carrier medium which comprises water or a mixture of water and at least one organic component; a particulate solid, preferably a pigment; and an ABC triblock polymer comprising an A block which is a hydrophilic polymer, a B block which is a polymer capable of binding to the particulate solid, a C block, different from the A and B block, which is a hydrophobic or hydrophilic polymer; and wherein the A and C blocks are end blocks.

Aqueous dispersions containing ABC triblock polymer dispersants

The present invention concerns a phototackifiable composition useful as a coating on a substrate consisting of an optically clear blend of two or more polymers and a photosensitive compound that forms a strong acid on exposure to actinic radiation. The invention also relates to a process for coating such a composition on a support and toning the image-wise exposed composition on the support.

Process for creating a tacky tonable image surface through exposure of a

Method for patterning organic polymer layers comprising the sequential steps:

Method and compositions for diffusion patterning

An aqueous ink jet ink composition having improved dispersion stability comprises an aqueous carrier medium, a pigment having a pH value below 7.0, and an AB block polymer consisting of an A block comprising a hydrophobic polymer having at least one basic amine functional groups, and a B block comprising a hydrophilic polymer selected from the group consisting of nonionic polymers and polymers containing acidic functional groups.

Amine-containing block polymers for pigmented ink jet inks

Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of a substance that is an acid generator upon exposure to actinic radiation.

Resist material for use in thick film resists

Dry processible photosensitive composition including photo-acid

This application discloses linear methacrylic ABC triblock polymers in which the composition of each of the three blocks is different and wherein at least one of the blocks is hydrophobic and at least one of the blocks is hydrophilic.

ABC triblock methacrylate polymers

Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of an acid generator comprising a novel diazonium salt.

Positive image formation utilizing resist material with carbazole

Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester moieties in the presence of an acid generator activated by actinic radiation such as UV-visible, deep ultraviolet, e-beam and x-ray radiation.

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Kennett Square, PA, United States of America

Walter R Hertler