International Business Machines Corporation

Other

Walter Jaerisch

Guenter Makosch

Gerd Haeusler

Claus Scheuing

Albert Frosch

Arno Schmackpfeffer

Gerhard Holzinger

G/enter Makosch

Optical imaging systems are used for making microstructures, and have to be very precise. In order to test these imaging systems, a new method, and a device for carrying out this method, are described in which two interferograms are made and compared. In a first step, an interferogram of an original pattern is made, followed by a second step in which an interferogram of a copy of the original pattern is produced using the identical conditions used to form the first interferogram. The pattern copy is made in the imaging system to be tested. In a third step, the two interferograms are compared with one another to provide a measure of the accuracy of the imaging system. This technique can be used for testing imaging systems which produce only a mirror image.

Method and device for testing optical imaging systems

A method for testing optical imaging systems by the use of moire stripes, wherein two copies of an optical grating are made and simultaneously illuminated to produce a moire pattern which is a measure of the distortion of the imaging system. In a first step an original grating is transferred by a light beam as a contact copy onto a substrate. In a second step, the imaging system to be tested copies the original grating for a second time onto the substrate, except that the second grating copy is rotated slightly with respect to the first grating copy. The points of intersection of the two superimposed gratings produce moire stripes when illuminated, the positions of the stripes being calculated precisely with the assumption that ideal gratings were used. If the imaging system to be tested shows distortions, the position of the moire stripes that are observed will not correspond to these calculated positions. The deviation therefrom is a measure of the imaging system errors.

Method of moire-metrical testing of optical imaging systems

This invention relates to an interferometric process, and particularly to a process for examining the planarity of surfaces.

Interferometer for determining the shape of an object

Described is a method for interferometric measurement in which a monochromatic, coherent and parallel, convergent or divergent radiation is directed onto the test object so as to generate in a manner of an interference fringe pattern, the distances between two adjacent fringes being correlated to .lambda./2 distances in the object space. The radiation reflected from the object and containing an interference field, giving rise to said fringe pattern, is redirected onto the test object, e.g. by a suitable mirror arrangement under an angle of incidence different from the angle of incidence of the radiation first impinging on the test object. This radiation, after reflexion from the test object, forms an interference field comprising four interfering components and producing, e.g. on an observation screen, an interference fringe field. By properly adjusting the angles of incidence of both radiations, the distances between adjacent fringes can be made to correspond to .lambda./4 distances in the object space.

Interferometric measurement with .lambda./4 resolution

In an interferometric measuring system, a collimated monochromatic and coherent beam of light (1, I.sub.1 -I.sub.n)impinges on a grating 1 disposed parallel to the test surface 2. It has been found that in the above arrangement, a diffraction order (preferably the first diffraction order S.sub.1 -S.sub.4) of the light reflected from the face of the grating opposite to the test surface is always parallel to three diffraction orders of the radiation which after being first diffracted upon its first passage through the grating and reflected from the test surface is again diffracted upon its second passage through the grating. These four radiations (S.sub.1 to S.sub.4) generate two interference fields, the combination of which generates a beat pattern. According to the invention, the angle of incidence of the radiation impinging onto the face of the grating opposite to the test surface is chosen in such a way (preferably from 0.5.degree. to 5.degree.) that the areas in which the beat patterns generate an additional field of interference fringes, related to .lambda./4 distances, from the test surface are a maximum. When properly selecting pairs of angles of incidence and of distances between test surface and grating the resolution of the resulting fringe pattern (interference fringes symmetrically interleaved by beat fringes) is improved by the factor of 2, i.e. the distance between two fringes is related to a .lambda./4 distance from the test surface, as opposed to the interferometric methods known heretofore where the maximum resolution is defined by fringe distances related to .lambda./2 distances from the test surface.

Interferometric measuring system

Disclosed is an interferometric apparatus and method for the inspection and detection of overlay errors characterized in that two plane polarized laser beams are directed onto the surface to be inspected, the angle included by these two beams being dimensioned in such a way that the radiation generating the plus or minus first order of the diffraction pattern of one beam is parallel to the other beam, thus generating an interference field which in the absence of overlay errors consists of an homogeneous fringe pattern while in the presence of such errors the fringe pattern is locally distorted. In a first embodiment, a first component of a laser beam is deflected onto a viewing screen by a beam splitter while a second component passes through the beam splitter to a mirror. The position and angle of the mirror is determined by the first order diffraction characteristics of the grating (object). The second component provides a first order of diffraction which interferes with the first component, producing an interference pattern on the viewing screen.

Growing community of inventors

Boeblingen, Germany

Walter Jaerisch