Hoechst Aktiengesellschaft

Morton International, Inc.

Kalle, Niederlassung Der Hoechst Ag

Walter Herwig

Kurt Erbes

Ulrich Geissler

Helga Sikora

Rudolf Decker

Hans-Jerg Kleiner

Karlheinz Burg

Siegfried Noetzel

Walter Luders

Rudolf Kern

Ludwig Brinkmann

Ulrich Bollert

Heide Sprengel

Ulrich Van Spankeren

Michael Emmelius

Dieter Mohr

Friedrich Engelhardt

Arnold Schneller

Werner Frass

Walter Dursch

Manfred Finke

Hartmut Steppan

Harald Cherdron

Kurt Walter Klupfel

Werner Lotz

Gerhard Usbeck

Gunther Kirsch

Manfred Hasenjaeger

Elisabeth Fetsch

The present invention relates to a radiation-polymerizable mixture which includes a polymerizable compound, a polymeric binder which has units of methacrylic acid, a methacrylic acid ester and a styrene, the latter in a proportion of 40 to 65% by weight, a finely divided mineral pigment on a silicic acid or silicate basis, a photopolymerization initiator, a compound having at least two epoxy groups in its molecule and a thermal hardener for epoxy groups. The mixture is advantageous, in particular, for producing solder masks and can be cured after exposure to an image and development by heating to about 80.degree. to 150.degree. C. to form a stencil which is resistant under soldering conditions.

Radiation-polymerizable mixture and process for producing a solder

A radiation-polymerizable mixture, recording material and process for using the recording material in relief recordings. The radiation-polymerizable mixture contains:

Radiation-polymerizable mixture

Process for the preparation of polymers of vinylphosphonic acid in protic diluents with the aid of catalysts which form free radicals, which comprises heating vinylphosphonic acid at temperatures of 40.degree. to 130.degree. C. in a total of 10 to 150% by weight of protic diluents for a total of 4-60 hours in the presence of 1.0 to 5.5% by weight of aliphatic peroxy-esters, diacyl peroxides and/or aliphatic azo compounds which decompose by half in one hour at temperatures below 122.degree. C.

Process for the preparation of polymers of vinylphosphonic acid in

A radiation-sensitive composition is disclosed which comprises: (a) a polymeric binder comprised of an alkenyl phenol monomer; (b) a compound which forms a strong acid under the action of actinic radiation; and (c) a compound which contains at least one acid-cleavable C-O-C bond and has a solubility in a liquid developer which is increased by the action of acid. The composition yields positive-working recording layers which are more flexible than layers comprising known novolak binders.

Radiation-sensitive composition and recording material based on

The present invention relates to a photosensitive transfer material, which comprises a flexible temporary support film which is preferably transparent, a thermoplastic photosensitive layer, optionally a flexible cover film on the free side of the photosensitive layer and, optionally, an intermediate layer between the support film and the photosensitive layer. The photosensitive transfer material is suitable for manufacturing photoresist stencils and solder masks. The temporary support film has a rough surface which exerts an embossing effect on the surface of the photosensitive layer and the intermediate layer, respectively. The mat-finish of the intermediate layer prevents an irregular deformation of this layer in moist air, while the mat-finish of the photosensitive layer precludes unwanted reflections.

Photosensitive transfer material having a support of defined roughness

A radiation-polymerizable mixture comprising a binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions; a radiation-activatable polymerization initiator; and a polymerizable polypropylene glycol diester with acrylic or methacrylic acid corresponding to the formula: ##STR1## wherein R represents a hydrogen atom or a methyl group and n represents a number from 2 to 13; and a light-sensitive copying material comprising a support and a light-sensitive layer comprising a mixture of the foregoing type. The radiation-polymerizable mixture of the invention produces non-tacky layers which exhibit a low sensitivity to atmospheric oxygen and are useful as dry or liquid photoresists.

Radiation polymerizable mixture and copying material produced therefrom

A radiation-polymerizable mixture comprising a compound having at least two terminal ethylenically unsaturated groups which can form a crosslinked polymer by means of free-radical initiated addition polymerization, a polymeric binder, a radiation activatable polymerization initiator, and a compound having two epoxy groups in the molecule and a molecular weight of not more than 1,500; and a photopolymerizable copying material having a flexible transparent temporary support and a transferrable thermoplastic photopolymerizable layer comprising the above-described radiation-polymerizable mixture.

Radiation-polymerizable mixture and photopolymerizable copying material

The invention relates to a new phosphorus-containing polymer, polyvinylmethylphosphinic acid. It is prepared by polymerization, preferably catalytic, of vinylmethylphosphinic acid or a salt thereof. The new polymer possesses valuable properties and is used, in particular, in the production of offset printing plates which have a light-sensitive layer.

Polyvinylmethylphosphinic acid, process for its manufacture and use

A radiation-polymerizable mixture comprising a polymeric binder, a radiation-activatable polymerization initiator and a polymerizable acrylate or methacrylate ester having at least two urethane groups in the molecule, said ester being a reaction product of glycerol dimethacrylate or glycerol diacrylate and a polyisocyanate obtained by reacting a polyhydroxy compound having from two to six hydroxyl groups with a diisocyanate or a reaction product of glycerol dimethacrylate or glycerol diacrylate and a diisocyanate. The new polymerizable urethanes provide the mixture with a high light-sensitivity, good reciprocity and a low tendency to crystallize.

Radiation polymerizable mixture containing reaction products of glycerol

A radiation-polymerizable mixture is described comprising (a) a compound which has at least two terminal ethylenically unsaturated groups and which can form a crosslinked polymer by means of free radical initiated chain addition polymerization, (b) a polymeric binder, (c) a radiation-activatable polymerization initiator which can be activated by radiation, and (d) a compound which is thermally crosslinkable with the polymeric binder (b), with the polymerization product of compound (a) and/or with itself and which, if its crosslinking groups are epoxy groups, has at least three epoxy groups. A photopolymerizable copying material is also disclosed having a flexible transparent temporary support and a transferable thermoplastic photopolymerizable layer comprising the foregoing radiation-polymerizable mixture. The photopolymerizable layer, after photocrosslinking, can be additionally cured by thermal crosslinking and is therefore suitable for the manufacture of solder resists and high performance printing plates.

A polyurethane corresponding to the formula: ##STR1## wherein Q is a divalent, mononuclear or dinuclear aromatic radial which is unsubstituted or is substituted by lower alkyl groups and which can contain, as a linking member, a lower alkylene group,

Elastomeric, ethylenically unsaturated polyurethanes and radiation

A process and an aqueous treatment solution for cleaning copper surfaces, in particular for removing residues of photoresist layers, which residues still adhere after development to the cleared copper areas, are described. The solution contains a water-soluble aliphatic sulfonic acid having 8 to 30 carbon atoms or a water-soluble salt thereof.

Process for cleaning copper-containing metal surfaces

In filler-containing molding compositions a very good compatibility between the hydrophilic filler and the hydrophobic polymer matrix is obtained by using as adhesion promotor alkali metal salts of alkyl or alkylene-sulfonic acids or alkyl sulfates, the derivatives thereof and the acids on which the salts are based. The flow properties of the molding compositions and the mechanical properties of the shaped articles made therefrom are improved.

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Bad Soden, Germany

Walter Herwig