Cypress Semiconductor Corporation

Walter G Branco

Edward M Shamble

Mark Smith

Jianmiu Qiao

A method for cleaning a plasma reactor clamber part () may include dipping the chamber part in a solvent () that may dissolve a material that has been redistributed on the chamber part by a reactive plasma. A chamber part may then be rinsed (), ultrasonically cleaned () in a ultrasonic cleaning liquid, and then rinsed again with a liquid that may evaporate at a lower temperature than an ultrasonic cleaning liquid (). A chamber part may then be blown dry () and baked (). In addition, or alternatively, a method may also include plasma cleaning a chamber part ().

Method for cleaning plasma etch chamber structures

This invention relates to a method of etching a bond pad in a semiconductor or integrated circuit, a method of using an etching apparatus and a semiconductor device.

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San Jose, CA, United States of America

Walter G Branco