Hughes Aircraft Company

Walter E Perkins, Jr

Wolfgang Knauer

Edward D Wolf

Electron or ion beam shaping apparatus has first aperture (28) and second aperture (30) through which the beam (20) is focused by first lens (24). Double deflection apparatus of either electromagnetic or electrostatic character is small and can be positioned between the aperture plates so that the image of both apertures can be focused on the target (16). Double deflection serves to vary spot size and shape and assures that target current density does not change while spot size is varied.

Electron and ion beam-shaping apparatus

High atomic number metals or compounds are used as electron beam registration alignment marks on low atomic number substrates; this combination produces enhanced secondary and backscattered electron video signals over topographical alignment marks of homogeneous materials. To augment the enhanced signal contrast, pairs of alignment marks are placed very close together (less than or equal to 3 micrometers), from which the gap between the pair produces the augmented, enhanced signal contrast. In particular, the backscattered electron signal is enhanced when detected with an energy sensitive collector such as a silicon diode detector.

Growing community of inventors

Woodland Hills, CA, United States of America

Walter E Perkins, Jr