Triquint Semiconductor Corporation

Walter Anthony Wohlmuth

Gary Alan Evans

Edward A Beam, Iii

Paul Saunier

William H Davenport

Andy Turudic

Ming-Yih Kao

David Michael Fanning

Rebouh Benelbar

A depletion mode (D-mode) field effect transistor (FET) is monolithically integrated with an enhancement mode (E-mode) FET in a multi-layer structure. The multi-layer structure includes a channel layer overlaid by a barrier layer overlaid by an ohmic contact layer. Source and drain contacts of the D-mode and E-mode FETs are coupled to the ohmic contact layer. A gate contact of the D-mode and E-mode FETs is coupled to the barrier layer. An amorphized region is provided beneath the E-mode gate contact within the barrier layer. The amorphized region forms a buried E-mode Schottky contact with the barrier layer. An alternative embodiment couples the gate contact of the D-mode transistor to a first layer that overlies the barrier layer, and provides a similar D-mode amorphized region within the first layer.

Monolithic integrated enhancement mode and depletion mode field effect transistors and method of making the same

An exemplary circuit embodiment includes a depletion-mode transistor and an enhancement-mode transistor. The circuit also includes a circuit portion coupled to a gate region of the depletion-mode transistor and to a gate region of the enhancement-mode transistor. In this embodiment, the circuit portion is configured to provide a reference voltage at an output node, wherein the reference voltage is associated with a difference between a voltage at the gate region of the depletion-mode transistor and a voltage at the gate region of the enhancement-mode transistor.

Producing reference voltages using transistors

A light-emitting device includes a GaAs substrate, a light-emitting structure disposed above the substrate and capable of emitting light having a wavelength of about 1.3 microns to about 1.55 microns, and a buffer layer disposed between the substrate and the light-emitting structure. The composition of the buffer layer varies through the buffer layer such that a lattice constant of the buffer layer grades from a lattice constant approximately equal to a lattice constant of the substrate to a lattice constant approximately equal to a lattice constant of the light-emitting structure. The light-emitting device exhibits improved mechanical, electrical, thermal, and optical properties compared to similar light-emitting devices grown on InP substrates.

Long wavelength laser diodes on metamorphic buffer modified gallium arsenide wafers

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Portland, OR, United States of America

Walter Anthony Wohlmuth