Tdk Corporation

Wakako Shiramura

Katsuaki Yanagiuchi

An electron device includes a first layer formed of a metal or metal alloy and a second layer adjoining the first layer and formed of a metal or metal alloy different from that of the first layer. In the region adjacent the first layer and the second layer, there is provided a concentration gradient layer formed of a mixture containing a metal or metal alloy contained in the first layer and a metal or metal alloy contained in the second layer. A covering film covers end faces of the first and second layers. With this arrangement, when a cleaning as by etching is carried out on the end faces of the multilayered film structure of the electron device, the end faces are etched in relatively smoothly connected surfaces because of the etched end face of the concentration gradient layer in a gentle slope, so that coverage of the covering film on the end faces of the multilayered film structure can be improved to increase the adherence strength of the covering film.

ELECTRON DEVICE COMPOSED OF LAMINATED LAYERS WITH A REGION BETWEEN TWO OF THE LAYERS COMPOSED OF METAL OR METAL ALLOY SELECTED TO BE A COMBINATION OF MATERIALS FROM WHICH THE LAYERS ARE MADE WITH A COVER FILM OVER END FACES OF THE LAYERS

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Tokyo, Japan

Wakako Shiramura