Shin-Etsu Chemical Co., Ltd.

Shin-Etsu Chemical C O., Ltd.

Waichi Yamamura

Tadakatsu Shimada

Hideo Hirasawa

Mitsukuni Sakashita

Shoji Kano

Yoshiaki Shimizu

Yoshihiro Kubota

Masataka Watanabe

Jiro Moriya

Kazuhisa Hatayama

Minoru Taya

Shinji Suzuki

Takaaki Nagano

Noboru Kimura

Koji Kato

Chikara Mori

Soichiro Kemmochi

Akihiro Hirate

Akihiko Suzuki

Hideki Fujii

Shoji Hoshino

Takaaki Nacao

Soichiro Kenmochi

A carbide-coated carbon material including a base material containing carbon as a main component and chlorine, and a carbide layer containing a carbide as a main component and chlorine, the carbide layer being disposed on the base material. The base material has, near an interface between the base material and the carbide layer, a base material buffer region where a chlorine concentration continuously changes in a direction toward the carbide layer. The carbide layer has, near the interface between the base material and the carbide layer, a carbide layer buffer region where the chlorine concentration continuously changes in a direction toward the base material. The carbide-coated carbon material has sufficient adhesion strength in the interface between the carbide layer and the base material containing carbon as a main component.

Carbide-coated carbon material

A film may be formed on a surface of a substrate by chemical vapor deposition in a reaction container provided with at least a first holding member that is capable of holding the substrate and a second holding member that is capable of holding the substrate independently from the first holding member, by: (a) forming a film on the surface of the substrate by chemical vapor deposition while holding the substrate by the first holding member; (b) moving at least one holding member among the first holding member and the second holding member in at least one direction of the upward direction and the downward direction to hold the substrate by the second holding member instead of the first holding member; and (c) forming a film on the surface of the substrate held by the second holding member by chemical vapor deposition.

Method of forming a film on a substrate by chemical vapor deposition

A member for an apparatus for manufacturing a semiconductor single crystal having long product life and a tantalum carbide coated carbon material are provided. The tantalum carbide coated carbon material according to the present invention is a tantalum carbide coated carbon material in which at least a part of a surface of a carbon base material is coated with a tantalum carbide coated film containing tantalum carbide as a main component, in which in the tantalum carbide coated film, an intensity of an X-ray diffraction line corresponding to a plane with respect to an out-of-plane direction is larger than intensities of X-ray diffraction lines corresponding to other crystal planes, and the intensity ratio is 60% or more with respect to a sum of intensities of X-ray diffraction lines corresponding to all crystal planes.

Tantalum carbide coated carbon material, manufacturing method thereof, and member for apparatus for manufacturing semiconductor single crystal

A PBN-coated carbon heater is disclosed in which the carbon base body is anisotropic with respect to thermal expansion coefficient such that the maximum-to-minimum coefficient ratio is 1.02 through 1.50 for temperatures between 50 and 800 degree C.; preferably the carbon base body is also anisotropic with respect to electric resistivity such that the maximum-to-minimum resistivity ratio is greater than 1.04 but not greater than 1.51, and the direction in which the resistivity is maximum coincides the direction of the heater pattern in which the electricity runs the longest distance.

Carbon body coated with pyrolytic boron nitride, and a carbon heater including this carbon body

The present invention relates to a corrosion-resistant multilayer ceramic member consisting at least of: a ceramic support substrate; an electrode layer formed on the ceramic support substrate; a power-supply member connected to the electrode layer; an insulating protection layer formed on the ceramic support substrate to cover the electrode layer; and a ceramic protection substrate of which at least a part is provided on the insulating protection layer. Thereby, there is provided a long-life corrosion-resistant multilayer ceramic member excellent in corrosion resistance even when exposed to a corrosive gas.

Corrosion-resistant multilayer ceramic member

The method is adapted for forming an aluminum nitride thin film having a high density and a high resistance to thermal shock by a chemical vapor deposition process and includes steps of mixing a gas containing aluminum atoms (Al) and a gas containing nitrogen atoms (N) with a gas containing oxygen atoms (O) and feeding the mixture to a member to be covered by an aluminum nitride thin film.

Method for forming an aluminum nitride thin film

There is disclosed a heating elementcomprising: at least

Heating element

The method, in which base material ingotis heated and softened in an electric furnace, drawn with a pair of pinch rollerand, and elongated to make base material rodhaving a smaller diameter than the ingot, features: forming either a roller groovehaving a curvature radius which is larger than the outer diameter of the base material rodor a V-shaped roller groovehaving the cross section consisting of straight lines on the surface of the pinch rollermade of metal; nipping with the facing roller groovesandrespectively formed on the surfaces of a pair of said pinch rollersand; and drawing said base material rod.

Method of elongating optical fiber base material, and apparatus for elongating the same

The invention provides an electrostatic chuck in which a workpiece-chucking surface is made flat. An electrostatic chuck with a built-in electric heating means comprises a base plate formed of carbon or a carbon-based composite material and, successively formed on one surface of the base plate, an insulating layer (a), an electroconductive layer (a) to serve as a chucking electrode and an dielectric layer (a) to form a workpiece-chucking surface and, successively formed on the other surface of the base plate, an insulating layer (b) and an electroconductive layer (b) to serve as an electric heater element, the electrostatic chuck improved in that the workpiece-chucking surface of the electrostatic chuck and an opposite surface thereof are warped to have a relationship selected from concavo-convex and convexo-concave, and in that the warping of the surfaces is in a manner such that the workpiece-chucking surface of the dielectric layer is rendered flat when the opposite surface of the electrostatic chuck is fastened to a machine.

Electrostatic chuck and manufacturing method thereof

There is provided an elongating method of an optical fiber base material which can easily correct a distorted portion of an optical fiber base material with it being possible to elongate the optical fiber base material to reduce its diameter. According to such an elongating method, in an elongating process of elongating an optical fiber base material by heating the optical fiber base material in a heating furnace so that a diameter of the optical fiber base material is reduced, before the optical fiber base material is elongated from an end thereof, a distorted portion of the optical fiber base material is connected by being heated to be softened in the heating furnace. To do so, the optical fiber base material is attached to a hanging mechanism so as to be hung in an electric furnace, the distorted portion of the optical fiber base material is heated to be softened. The elongation is stated after a difference between the elongation axis and an end of one of the optical fiber base material and the dummy rod attached to the optical fiber base material is reduced to be 10 mm or less. Here, the difference may be detected by using a noncontact position detecting apparatus, which may be one of a laser measuring device and an image processing apparatus.

Elongating method of optical fiber base material

A method for manufacturing an optical fiber comprises setting a heating condition for heating a glass rod, which is a parent material of the optical fiber, and an elongating speed of the glass rod based on a prescribed numerical value which changes with a progress of elongation of the glass rod; heating and elongating the glass rod to generate a preform based on the heating condition and the elongating speed which are set by the setting; and drawing the preform to a filament-like form by further heating the preform to generate the optical fiber.

Optical fiber manufacture method, preform manufacture method, and preform manufacture apparatus

Method of making an optical fiber preform where a second elongation is based on a mark on a glass rod

A method for manufacturing a glass rod ( ), which is a parent material of an optical fiber ( ), comprising: adjusting a vertical inclination of a standard rod ( ) having a predetermined straightness; and heating and elongating a base material ( ), which is a parent material of the glass rod ( ), along an axis of the standard rod ( ), the vertical inclination of which is adjusted, to generate the glass rod ( ).

Straightening a glass rod for use in making an optical fiber preform

The glass base material drawing apparatus for heating and drawing a glass base material has a storage unit for storing the glass base material having an opening unit that is opened along the longitudinal direction of the storage unit when the glass base material is placed inside the storage unit, a heating unit for heating the glass base material that has been stored inside the storage unit via the opening unit, and a pull-out unit for pulling out the glass base material heated by the heating unit. The opening unit may be opened in such a manner that the glass base material is moved from a side direction of the storage unit into the interior of the storage unit. A main axis for supporting the glass base material is connected to the glass base material. The storage unit may have a penetration hole through which the main axis is inserted when the opening unit is closed.

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Gunma, Japan

Waichi Yamamura