Other

United Microelectronics Corp.

W H Cheng

Chia-Fu Yeh

Yu-Chang Chow

Cobby Lee

C M Chi

A process for cleaning the interior walls of a reaction chamber after a number of silicon wafers is etched inside the chamber. The cleaning process includes bombarding the interior walls of the chamber with a first type of plasma in a dry cleaning operation, and then bombarding the interior walls of the chamber with a second type of plasma containing the element hydrogen in a warm-up operation. No silicon wafers need to be placed inside the chamber when the dry cleaning operation or the warm-up operation is conducted.

Method for cleaning interior of etching chamber

A chair assembly, which includes a plurality of supporting legs connected to a locating member and a ring to hold a stem socket by plugging, a stem inserted into the center through hole on the stem socket and retained at the desired elevation by a tapered packing ring, a cushion, and a mounting device inserted into a bottom hole on the cushion and secured to the cushion through a rotary joint and having a bottom end fitted into a hole on the stem for permitting the cushion to be supported on the stem.

Chair assembly

A multi-deck rack comprising a plurality of boards having two tapered holes at two opposite ends respectively attached with a taper ring each and mounted on two supporting posts at different levels, wherein downward pressure on the boards causes the boards to be firmly retained on the supporting posts in position; upwards pressure on the boards causes the boards to be moved upwards on the supporting posts for adjusting level positions.

Growing community of inventors

Hsin, Tien, Taipei, Taiwan

W H Cheng