The Perkin-elmer Corporation

W Derek Buckley

Henry Windischmann

Dawn L Duly

George N Steinberg

This invention is directed to an improvement in an x-ray lithography system having an x-ray point source of radiation, a wafer disposed in spaced relationship with respect to the source, and a mask disposed between the source and the wafer whereby radiation from the source passes through the mask to the wafer, said improvement comprising the provision of an x-ray absorbent element mounted between the source and the wafer, said element having a radial absorption gradient profile to compensate for radial flux variation of the x-rays.

Illumination system for x-ray lithography

A method for tensioning a thin film on a support ring to achieve an optically flat membrane. The support ring is optically flat with a slight bevel at its outside edge where the membrane is epoxied to the support ring.

Method of fabrication of an optically flat membrane

The invention is also directed to a method of fabricating a pellicle cover assembly for use in a projection printing system for forming an image on a radiation sensitive wafer, the method comprising the steps of applying a gold film onto the surface of a wafer, applying a polymer film onto the gold film surface, curing the polymer film, adhering a support ring to the polymer film, cutting through the polymer and gold films between the ring and wafer edges to expose the wafer surface, peeling the ring off the wafer and etching off the gold film.

Method of fabricating a pellicle cover for projection printing system

Disclosed herein is an electron emitter assembly for an electron gun which includes a first emitter ring, a second emitter ring, a power supply, connectors for connecting the power supply to the two electron emitter rings so that heating current flows from the power supply through the rings, and said rings being mounted so that a magnetic field formed by the second ring counteracts the magnetic field formed by the first ring.

Electron emitter assembly

This invention relates to apparatus for effecting alignment and spacing control of a mask and wafer for use, for example, in x-ray lithography, which includes, in combination, two optical channels for effecting lateral and vertical alignment at two spaced alignment targets respectively on the element, two spaced position sensors located on a line which is oblique with respect to a line joining the two alignment targets, and linkage for maintaining the distances between the position sensors and the element equal one to the other.

Apparatus for effecting alignment and spacing control of a mask and

The invention is directed to a method of fabricating a pellicle cover assembly for use in a projection printing system for forming an image on a radiation sensitive wafer, the method comprising the steps of applying a gold film onto the surface of a wafer, applying a polymer film onto the gold film surface, curing the polymer film, adhering a support ring to the polymer film, cutting through the polymer and gold films between the ring and wafer edges to expose the wafer surface, peeling the ring off the wafer and etching off the gold film.

A method of depositing X-ray absorber patterns on a mask membrane to achieve minimum pattern feature dimensions less than 1 .mu.m. The membrane is covered with an ultraviolet (VU) sensitive photoresist which carries a thin metallic film. The metallic film is coated with an electron beam resist. The electron beam resist is exposed to the desired pattern by an electron beam. After development, the metal film is etched through the remaining electron beam resist. This forms a stencil overlying the lower UV photoresist layer which is then exposed by an ultraviolet or soft X-ray source. After development, an X-ray absorber, such as gold, is deposited on the membrane. The final exposure step may be done by means of a point source of radiation. The X-ray absorbers will then have sloping walls to prevent shadowing of the X-ray source.

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Easton, CT, United States of America

W Derek Buckley