Intel Corporation

Apple Inc.

Vyom Sharma

Christopher P Auth

Walid M Hafez

Leonard P Guler

Gopinath Bhimarasetti

Chia Chi Wu

Ming Gao

Michael Vosgueritchian

Nan Chen

Wenhao Wang

Szuya S Liao

Gaurav Thareja

Rohan K Bambery

An electronic device has a keyboard with an internal membrane. The membrane has a set of strain gauges configured to respond to a key press, such as when a collapsible dome collapses into contact with the membrane. The strain gauges are connected in a half Wheatstone bridge configuration and are positioned on the membrane in order to limit effects of temperature and subtle flexure of the membrane. The strain gauges are also configured to magnify detection of a resistance differential when a keycap is pressed with sufficient force.

Strain sensing key membrane

An embodiment includes an apparatus comprising: first and second semiconductor fins that are parallel to each other; a first gate, on the first fin, including a first gate portion between the first and second fins; a second gate, on the second fin, including a second gate portion between the first and second fins; a first oxide layer extending along a first face of the first gate portion, a second oxide layer extending along a second face of the second gate portion, and a third oxide layer connecting the first and second oxide layers to each other; and an insulation material between the first and second gate portions; wherein the first, second, and third oxide layers each include an oxide material and the insulation material does not include the oxide material. Other embodiments are described herein.

Gate isolation in non-planar transistors

An embodiment includes a system comprising: a first gate and a first contact that correspond to a transistor and are on a first fin; a second gate and a second contact that correspond to a transistor and are on a second fin; an interlayer dielectric (ILD) collinear with and between the first and second contacts; wherein (a) the first and second gates are collinear and the first and second contacts are collinear; (b) the ILD includes a recess that comprises a cap layer including at least one of an oxide and a nitride. Other embodiments are described herein.

Confined and scalable helmet

Growing community of inventors

Portland, OR, United States of America

Vyom Sharma