Asml Netherlands B.v.

Asml Holding N.v.

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Justin Lloyd Kreuzer

Sebastianus Adrianus Goorden

Simon Reinald Huisman

Igor Matheus Petronella Aarts

Christopher John Mason

Krishanu Shome

Tamer Mohamed Tawfik Ahmed Mohamed Elazhary

Yuxiang Lin

Irit Tzemah

An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.

Alignment sensor apparatus for process sensitivity compensation

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Norwalk, CT, United States of America

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