Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Centrotherm Photovoltaics Ag

Centrotherm Elektrische Anlagen Gmbh & Co.

Volkmar Hopfe

Ralf Spitzl

Ines Dani

Harald Wanka

Lutz Fabian

Harald Beese

Wulf Grählert

Gunter Krodel

Moritz Heintze

Rainer Moeller

Elena Lopez

Milan Rosina

Gerrit Mäder

Steffen Krause

Daniela Rogler

Eckehard Hofmüller

The invention relates to a method for the one-sided removal of a doped surface layer on rear sides of crystalline silicon solar wafers. In accordance with the object set, doped surface layers should be able to be removed from rear sides of such solar wafers in a cost-effective manner and with a handling which is gentle on the substrate. In addition, the front side should not be modified. In accordance with the invention, an etching gas is directed onto the rear side surface of silicon solar wafers with a plasma atmospheric pressure.

Method for the removal of doped surface layers on the back faces of crystalline silicon solar wafers

The invention relates to a device and a method for the optical detection of substances contained in exhaust gases of chemical processes, wherein exhaust gases are conducted all the way through a channel element that forms an optical measuring section; at the channel element there are two flanges, closed off to the ambient area, and at least one window element through which electromagnetic radiation for the optical detection can be directed from a radiation source to a optical detector through the channel element; a purge gas is fed through the flanges into the channel element, whereby with a purge gas led into one of the flanges a closed laminar purge gas flow is to be formed in the bottom area of the interior of the channel element.

Device and method for optical detecting substances contained in waste gases of chemical processes

The present invention relates to a method for purifying process waste gases by introducing them into a waste gas purification system that includes a reaction chamber and by post-treating the reaction products that leave the reaction chamber in a washing or sorbtion chamber with an associated washing agent circuit. The type and amount of harmful substances in the process waste gas are continuously measured before the waste gases enter the waste gas purification system. In addition, the type and amount of harmful substances in the reaction products that leave the waste gas purification system are simultaneously determined directly at the exit of the system and the measuring signals are used to regulate the operating parameters of the waste gas purification system.

Method for purifying process waste gases

Growing community of inventors

Kleingiesshübel, Germany

Volkmar Hopfe