Schott Glaswerke

Hoffmann-La Roche Inc.

Jenaer Glaswerk Schott & Gen.

Volker Paquet

Ralf T Kersten

Johannes Segner

Jurgen Otto

Ulrich Ackermann

Martin Heming

Harald Krummel

Heinz-Werner Etzkorn

Roland Hochhaus

Uwe Rutze

Gunter Weidmann

Dieter Krause

Christof Fattinger

Hartmut Bauch

Heinz W Etzkorn

Friedrich G Baucke

Hrabanus Hack

Wolfgang Siefert

Bernd Metz

Helge Vogt

Torsten Holdmann

Ewald Morsen

Ulrike Jost

Peter Krause

Johannes Zauner

Gunther Weidmann

Heniz-W Etzkorn

Uwe Ruetze

Martin Walther

Ulrich Lange

Roland Langfeld

The apparatus for coating or treating a substrate in a remote plasma CVD process includes a reaction chamber for the substrate; modular plasma source devices for exciting an excitation gas, preferably with microwaves, to form a plasma in the excitation gas arranged, either in a linear arrangement or in a two-dimensional planar array, over the substrate; devices for conducting a reactant gas over the substrate in the reaction chamber and for mixing the excitation gas containing the plasma with the reactant gas in the reaction chamber in the presence of the substrate and a device for removing exhaust gas from the reaction chamber. A device is provided for moving the substrate relative to the plasma source devices in a motion direction at an angle to the long axis of the arrangement or array of plasma source devices to minimize edge effects.

Remote-plasma-CVD method for coating or for treating large-surface substrates and apparatus for performing same

PICVD process and device for the coating of curved substrates

The remote-plasma-CVD process for coating or treating large-surface substrates includes exciting an excitation gas located remotely from a substrate surface to be coated or treated in modular plasma source devices arranged either in a linear arrangement or in a planar, grid-like arrangement over the substrate surface and feeding a reactant gas with the excitation gas from the plasma source devices to the substrate surface to excite the reactant gas with the excitation gas and thus form a coating on the substrate surface or treat the substrate surface.

Remote-plasma-CVD method for coating or for treating large-surface

A process for coating an exterior of a lamp is disclosed, which comprises performing the coating in a microwave reactor by a microwave plasma CVD process and coupling microwave radiation into the microwave reactor with a microwave power greater than or equal to a power threshold value at which a plasma with reduced microwave permeability is ignited in the microwave reactor.

Process for coating an exterior portion of a lamp

The invention relates to a plasma CVD method for producing a gradient layer wherein the layer gradient is produced in the direction of layer growth by changing at least one plasma power parameter during the coating process. According to the invention, thin gradient layers are generated with high precision by supplying the plasma power in a pulsed manner and adjusting the layer gradient by changing the plasma power parameters of pulse amplitude, pulse duration and/or pulse interval.

Plasma CVD method of producing a gradient layer

An optical waveguide is disclosed with a substantially planar substrate and a waveguide layer applied to the substrate. The invention resides in that the substrate consists of a synthetic resin or of a material having a high organic proportion. This has the advantage that the high index of refraction of the inorganic waveguide layer is combined with the material properties of the synthetic resin substrate, such as, for example, breaking resistance, plastic and thermoplastic moldability, photochemical structuring ability, and others.

Optical waveguide with a substantially planar substrate and process for

Optical inorganic waveguide with a substantially planar organic substrate

To coat several cap-shaped substrates simultaneously in an economical way with the same and high quality, several coating chambers are connected into a cap coating station by a symmetrical gas line system with a common gas generator and by another gas line system with a common vacuum pump. The gas lines have a cross sectional area Q.sub.A (x) and a cross sectional form Q.sub.F (x) which as a function of the distance x from the gas generator or from the vacuum pump are substantially the same. In this way, the same flow conditions are assured in all coating chambers. The gas line systems can be formed by precision pipes or by a stack of solid plates, in which gas ducts are introduced by boring or milling. Several cap coating stations, which are connected by suitable symmetrical gas line systems with a common vacuum pump and a common gas generator, can be combined to form a unit.

Apparatus for coating cap-shaped substrates

A process and an apparatus for economically igniting microwave plasmas wherein no undesirable reaction products in the reaction chamber impair the quality of cladding produced thereby. The plasma is ignited on the gas outlet side of the reaction chamber by means of a high voltage that is applied at least for a short period of time. High-frequency pulses or low-frequency high voltages with frequencies in the range from 10 to 100 kHz are utilized. The high voltage is synchronized with the microwave pulses. According to a further process, the microwave pulses are excessively increased for a short time at least at their beginning. Also periodic excessive increases of the microwave pulses are possible A switchable high-voltage source is connected by way of a delay member and a current supply unit to the microwave device The output of the switchable high-voltage source is applied to the gas discharge line of the reaction chamber.

Process and apparatus for the ignition of CVD plasmas

A process is disclosed for the production of an optical thin film waveguide of TiO.sub.2 with an attenuation of &lt;5 dB/cm on a planar inorganic substrate wherein the thin film waveguide is produced by a microwave plasma CVD process (PCVD).

Process for the production of a thin film optical waveguide of TiO.sub.2

A plasma-CVD process and apparatus for coating strongly arched, dome-like substrates with a dielectric and/or metallic coating system on the inside and/or outside face. The thickness of the gas layer to be reacted above the face to be coated is adjusted such as with the aid of the displacement body, so that the extent of the homogeneous reaction or formation occurring in the gas layer during a plasma phase is harmless for the desired coating quality. Strongly arched substrates coated with a uniform coating of highest optical quality and also mechanical, thermal and chemical stability without complicated substrate movement. Specified axial and azimuthal coating thickness profiles can also be superimposed by suitably shaping the displacement body.

Plasma CVD process for coating a dome-shaped substrate

A plasma or photo-induced chemical vapor deposition coating process and apparatus are provided for applying thin dielectric coatings on planar, curved, and large area substrates. A plasma is generated in a tubular outer conductor. This plasma or the UV radiation occurring in the plasma passes through an opening into a reaction chamber. The opening preferably extends axially along the outer conductor and communicates with the interior of the reaction chamber. At least one component of the reaction gas is introduced directly to the opening or into the reaction gas is introduced directly to the opening or into the reaction chamber adjacent to the opening, bypassing the outer conductor. In this apparatus, the reactive deposition of a coating onto a substrate occurs only in the reaction chamber and below the opening from the outer conductor.

CVD coating process for producing coatings and apparatus for carrying

For producing a fiberoptic waveguide preforms by plasma pulse-induced chemical vapor deposition (PICVD), blank glass tubes are prepared having a continuously increasing internal diameter in the direction of gas flow. This type of blank compensates for the otherwise occurring decrease in the density of the layer-forming molecules due to pressure drop, thereby permitting the formation of a uniform masswise deposition of layer-forming molecules along the length of the tube. This permits the production of collapsed preforms having a series of coating layers of substantially uniform thickness.

Internal coating of a glass tube by plasma pulse-induced chemical vapor

A plasma or photo-induced chemical vapor deposition coating process and apparatus are provided for applying thin dielectric coatings on planar, curved, and large area substrates. A plasma is generated in a tubular outer conductor. This plasma or the UV radiation occurring in the plasma passes through an opening into a reaction chamber. The opening preferably extends axially along the outer conductor and communicates with the interior of the reaction chamber. At least one component of the reaction gas is introduced directly to the opening or into the reaction chamber adjacent to the opening, bypassing the outer conductor. In this apparatus, the reactive deposition of a coating onto a substrate occurs only in the reaction chamber and below the opening from the outer conductor.

Plasma-enhanced CVD coating process

Growing community of inventors

Mainz, Germany

Volker Paquet