Carl Zeiss Nts Gmbh

Carl Zeiss Microscopy Gmbh

Leo Elektronenmikroskopie Gmbh

Nanotools Gmbh

Volker Drexel

Dirk Preikszas

Michael D G Steigerwald

Gerd Ludwig Benner

Ulrich Mantz

Bernd Irmer

Peter Gnauck

Erik Essers

Michael Steigerwald

Christian Penzkofer

Eugen Weimer

Johannes Bihr

Wolfram Buehler

Bernd Hafner

Stephan Kujawa

David Bate

Eric Essers

A particle source for producing a particle beam includes a particle emitter, a first plate, a first deflector and a second plate with an aperture. The first plate has a smaller aperture, downstream of which a first beam is formed, and a larger aperture, downstream of which a second beam is formed. A controller sets the deflection angle of the deflector so that in a first mode of operation that particles of the first beam pass through the aperture in the second plate and form the particle beam produced by the particle source. The controller sets the deflection angle so that in a second mode of operation that particles of the second beam pass through the aperture in the second plate and form the particle beam produced by the particle source.

Particle source for producing a particle beam and particle-optical apparatus

A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.

Electron beam source and method of manufacturing the same

An electron beam source includes a base and a tip fixed to the base and extending from the base. The tip includes a core and a coating applied to the core. The core has a surface that includes a first material. The coating includes a second material which is different from the first material. The second material forms a surface of the tip, and the second coating includes more than 30% by weight of a lanthanide element.

An electron beam device has an electron gun for generating an electron beam, an objective lens for focusing the electron beam on an object and at least one detector for detecting electrons emitted by the object or electrons backscattered by the object. Detection of electrons emitted by or backscattered by an object may be simplified and improved using quadrupole devices and certain configurations of these devices provided in the electron beam device.

Electron beam device

An objective lens for focussing charged particles includes a magnetic lens and an electrostatic lens whose components are displaceable relative to each other. The bore of the outer pole piece of the magnetic lens exhibits a diameter Dwhich is larger than a diameter Dof the bore of the inner pole piece of the magnetic lens. The following relationship is satisfied: 1.5&#xb7;D&#x2266;D&#x2266;3&#xb7;D. The lower end of the inner pole piece is disposed in a distance of at least 2 mm offset from the inner end of the outer pole piece in a direction of the optical axis.

Objective lens

An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.

Electron-beam device and detector system

A detector for scanning electron microscopes, which can be used under different pressure conditions in the specimen chamber of the electron microscope, designed for the detection of both electrons and light. For this purpose, the detector has a photodetector and a scintillator of a material transmissive for visible light connected before the photodetector. The scintillator can be provided with a coating transparent to visible light. By the application of different potentials, the detector is suitable for the detection of electrons in high vacuum and for the detection of light with high pressures in the specimen chamber.

Detector for variable pressure areas and an electron microscope comprising a corresponding detector

A detector system for a particle beam apparatus, in particular for a scanning electron microscope, has a target structure, which in a central region near the optical axis includes an electron-converting material. The target structure also includes either a non-converting material in a region remote from the optical axis or the region remote from the optical axis is offset in the direction of the optical axis with respect to the region near the optical axis that includes the electron-converting material. The detector system makes possible separate detection of only back-scattered electrons or only secondary electrons.

Detector system for a particle beam apparatus, and particle beam apparatus with such a detector system

A cascade type pump arrangement for a particle beam device has first and second turbomolecular pumps, wherein an outlet of the second turbomolecular pump is forepumped by an intermediate pressure region situated between a main pump port and an outlet of the first turbomolecular pump. The particle beam device has a particle beam source operated in ultra high vacuum and a specimen chamber operated at pressures from high vacuum at least up to 1 hPa.

Particle beam device with a particle source to be operated in high vacuum and cascade-type pump arrangement for such a particle beam device

In an electron beam device such as a raster electron microscope, two annular detectors are arranged at a distinct distance along the optical axis between a beam producer and an objective. The distance between the two detectors amounts to at least 25% of the distance between the specimen-side detector and the specimen. The source-side detector serves for detection of back-scattered or secondary electrons which are transmitted through the bore provided through the specimen-side detector for the passage of the primary particle beam. The source-side detector is a conversion diaphragm with an Everhart Thornley detector arranged laterally thereof. The conversion diaphragm produces secondary electrons on impingement of charged particles. By application of two detectors offset in the direction of the optical axis, the yield of the secondary electrons used for image production is increased. The secondary electrons are separated according to their angle of emergence from the specimen.

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Königsbronn, Germany

Volker Drexel