Asml Netherlands B.v.

Vladimir Vital'Evitch Ivanov

Konstantin Nikolaevitch Koshelev

Givi Georgievitch Zukavishvili

Vadim Yevgenyevich Banine

Frederik Bijkerk

Evgenii Dmitreevitch Korop

Erik Roelof Loopstra

Martinus Hendrikus Antonius Leenders

Lucas Henricus Johannes Stevens

Olav Waldemar Vladimir Frijns

Vladimir Mihailovitch Krivtsun

Norbertus Benedictus Koster

Bastiaan Matthias Mertens

Pavel Stanislavovich Antsiferov

Erik René Kieft

Robert Rafilevitch Gayazov

Yurii Victorovitch Sidelkov

Vsevolod Grigorevitch Koloshnikov

Evgenil Dmitreevitch Korob

A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of said radiation source so as to initiate said discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.

Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby

A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.

Radiation source, lithographic apparatus and device manufacturing method

A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, lithium, tin or any suitable material. To improve conversion efficiency, the source unit may be constructed to have a low inductance, and operated with a minimum of plasma. To, for example, improve heat dissipation, a fluid circulation system can be created within the source volume and a wick by using a fluid in both its vapor and liquid states. To, for example, prevent contamination from entering a lithographic projection apparatus, the source unit can be constructed to minimize the production of contamination, and a trap can be employed to capture the contamination without interfering with the emitted radiation.

Radiation source, lithographic apparatus, and device manufacturing method

Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.

Lithographic projection apparatus, device manufacturing method, and device manufactured thereby

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Moscow, Russia

Vladimir Vital'Evitch Ivanov