Asml Netherlands B.v.

Vladimir Mihailovitch Krivtsun

Vadim Yevgenyevich Banine

Vladimir Vitalevitch Ivanov

Vladimir Vitalevich Ivanov

Konstantin Nikolaevitch Koshelev

Konstantin Nikolaevich Koshelev

Andrei Mikhailovich Yakunin

Robert Rafilevitch Gayazov

Viacheslav Medvedev

Erik Roelof Loopstra

Jan Bernard Plechelmus Van Schoot

Gerardus Hubertus Petrus Maria Swinkels

Olav Waldemar Vladimir Frijns

Carolus Ida Maria Antonius Spee

Alexander Matthijs Struycken

Klaas Timmer

Harm-Jan Voorma

Pavel Stanislavovich Antsiferov

Josephus Jacobus Smits

Lambertus Adrianus Van Den Wildenberg

Yurii Victorovitch Sidelnikov

Johannes Bernardus Ridder

Oleg Yakushev

Maarten Marinus Johannes Wilhelmus Van Herpen

Arno Jan Bleeker

Johannes Hubertus Josephina Moors

Sander Frederik Wuister

Michel Riepen

Levinus Pieter Bakker

Derk Jan Wilfred Klunder

Martinus Cornelis Maria Verhagen

Theodorus Petrus Maria Cadee

Wouter Anthon Soer

Henricus Petrus Maria Pellemans

Lucas Henricus Johannes Stevens

Gerbrand Van Der Zouw

Hendrikus Gijsbertus Schimmel

Arnoud Cornelis Wassink

Denis Alexandrovich Glushkov

Givi Georgievitch Zukavishvili

Johannes Matheus Marie De Wit

Erik René Kieft

Kurt Gielissen

Paul Peter Anna Antonius Brom

Vladimir Vital'Evitch Ivanov

Evgeny Dmitrievich Korop

Evgenii Dmitreevitch Korob

Dmitriy Victorovich Lopaev

Yurii Victorovitch Sidelkov

Vsevolod Grigorevitch Koloshnikov

Givi Georgievich Zukakishvili

Ralph Josef Johannes Gerardus Anna M Smeets

Alexandre Kodentsov

Vladimir Vital'evitch Ivanov

A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.

Radiation system and lithographic apparatus

A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.

Source-collector device, lithographic apparatus, and device manufacturing method

A radiation source () suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle configured to direct a stream of fuel droplets () along a trajectory () towards a plasma formation location (). The radiation source is configured to receive a first amount of radiation () such that the first amount of radiation is incident on a fuel droplet () at the plasma formation location, and such that the first amount of radiation transfers energy into the fuel droplet to generate a modified fuel distribution (), the modified fuel distribution having a surface. The radiation source is also configured to receive a second amount of radiation () such that the second amount of radiation is incident on a portion of the surface () of the modified fuel distribution, the second amount of radiation having a p-polarized component with respect to the portion of the surface; and such that the second amount of radiation transfers energy to the modified fuel distribution to generate a radiation generating plasma, the radiation generating plasma emitting a third amount of radiation (). The radiation source further comprises a collector (CO) configured to collect and direct at least a portion of the third amount of radiation. The radiation source is configured such that the second amount of radiation propagates in a first direction, the first direction being non-parallel to a normal to the portion of the surface of the modified fuel distribution.

Radiation source

A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.

Lithographic apparatus

A lithographic process includes the use of a silicon-containing polymer or a compound that includes at least one element selected from the group consisting of: Ta, W, Re, Os, Ir, Ni, Cu or Zn in a resist material for an EUV lithographic process. The wavelength of the EUV light used in the process is less than 11 nm, for example 6.5-6.9 nm. The invention further relates to novel silicon-containing polymers.

Lithographic patterning process and resists to use therein

A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from tungsten-molybdenum alloy or a molybdenum-rhenium alloy or a tungsten-rhenium alloy or a tungsten-molybdenum-rhenium alloy.

Spectral purity filter

A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L&#x3e;d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.

Photon source, metrology apparatus, lithographic system and device manufacturing method

A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.

Lithographic apparatus and device manufacturing method

An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.

Apparatus with plasma radiation source and method of forming a beam of radiation

A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

Ex-situ removal of deposition on an optical element

A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.

An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an ablation material and encloses a volume. The assembly further has an ablation generation device. The ablation generation device is arranged to ablate at least a portion of the ablation material upon reception of a blocking signal. The assembly has a control unit, which is arranged to control the ablation generation device.

Assembly for blocking a beam of radiation and method of blocking a beam of radiation

A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

An apparatus for producing radiation by an electrically operated discharge has a first electrode, a second electrode. and a capacitor bank. The electrodes are configured at a distance from each other which allows plasma ignition. The capacitor bank is electrically connected at a first terminal to the first electrode and at a second terminal to the second electrode, and configured to store a discharge energy. The electrodes and the capacitor bank form an electric circuit. At least the first electrode is formed by an electrically conducting fluid supplied via a first feeding line. The apparatus further has a charger and a first high inductance unit. The charger is connected to at least one of the terminals. The first high inductance unit is provided upstream the first terminal in the first feeding line for electrically decoupling the electric circuit.

Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby

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Troitsk, Russia

Vladimir Mihailovitch Krivtsun