G & H Technologies, LLC

Nano-Product Engineering, LLC

Vapor Technologies, Inc.

Southwest Research Institute

Other

Delta Faucet Company

Vladimir I Gorokhovsky

Yuhang Cheng

Brad B Heckerman

Klaus Brondum

Patrick Sullivan

William Grant

Edward Taylor

David Humenik

Patrick Byron Jonte

Bryce Randolph Anton

Patrick A Sullivan

Victor Champagne

Kent Edward Coulter

Francis Yu Chang Huang

Ganesh Kamath

Rudi Koetter

Edward W Taylor

An apparatus generates energetic particles and generates a plasma of a vaporized solid material and gaseous precursors for the application of coatings to surfaces of a substrate by way of condensation of plasma and for electric propulsion applications.

Reactors for plasma assisted treatment of powder

Sources for plasma assisted electric propulsion

An electrode for an ozone generator or chlorine generator includes an electrically conductive substrate, a doped-Si layer disposed over the conductive substrate, and a boron-doped diamond (BDD) layer disposed over the doped-silicon layer. The doped-silicon layer defines a discrete architecture that maintains adhesion throughout a high temperature CVD boron-doped diamond process. Another electrode having a PVD nitrogen-doped diamond (ta-C:N) layer disposed over a conductive substrate is also provided.

Diamond coated electrodes for electrochemical processing and applications thereof

An arc coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall, the top wall, and the bottom wall define a coating cavity and a chamber center. A plasma source is positioned at the chamber center wherein the plasma source comprises a central cathode rod and a plurality of cathode rods surrounding the central cathode rod. The coating system also includes a sample holder that holds a plurality of substrates to be coated. Characteristically, the sample holder rotatable about the chamber center at a first distance from the chamber center.

PVD system with remote arc discharge plasma assisted process

A coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall defines a chamber center. A plasma source is positioned at the chamber center. The coating system also includes a sample holder that holds a plurality of substrates to be coated which is rotatable about the chamber center at a first distance from the chamber center. A first isolation shield is positioned about the chamber center at a second distance from the chamber center, the first isolation shield being negatively charged.

Plasma corridor for high volume PE-CVD processing

Electrodes for use within an ozone generator and method for assembling and using the same.

Electrode for an ozone generator

A reactor includes a plasma duct; a gas inlet, at a distal end of the plasma duct, for receiving a gas; a gas outlet at a proximal end of the plasma duct for removing a portion of the gas to generate a gas flow through the plasma duct; a separating baffle positioned between the plasma duct and the gas outlet for restricting gas flow to maintain high pressure in the plasma duct; a shielded cathodic arc source positioned in a cathode chamber at the proximal end; a remote anode, positioned in the plasma duct, for holding a substrate and cooperating with the cathodic arc source to generate an electron flow opposite the gas flow, to initiate a plasma discharge perpendicular to the remote anode at least in vicinity of the remote anode and deposit ions of the plasma discharge on the substrate to form a diamond coating.

Reactors and methods for making diamond coatings

A reactor for plasma-assisted chemical vapor deposition includes a plasma duct for containing one or more substrates to be coated by ions; an arc discharge generation system for generating a flow of electrons through the plasma duct from a proximal end toward a distal end of the plasma duct; a gas inlet coupled to the distal end for receiving a reactive gas; a gas outlet coupled to the proximal end for removing at least a portion of the reactive gas to generate a flow of the reactive gas through the plasma duct from the distal end toward the proximal end, to generate the ions from collisions between the electrons and the reactive gas; and a separating baffle positioned for restricting flow of the reactive gas out of the plasma duct to maintain a high pressure in the plasma duct to increase rate of deposition of the ions onto the substrates.

Reactors for plasma-assisted processes and associated methods

A low friction top coat over a multilayer metal/ceramic bondcoat provides a conductive substrate, such as a rotary tool, with wear resistance and corrosion resistance. The top coat further provides low friction and anti-stickiness as well as high compressive stress. The high compressive stress provided by the top coat protects against degradation of the tool due to abrasion and torsional and cyclic fatigue. Substrate temperature is strictly controlled during the coating process to preserve the bulk properties of the substrate and the coating. The described coating process is particularly useful when applied to shape memory alloys.

Wear resistant vapor deposited coating, method of coating deposition and applications therefor

A coating system includes a vacuum chamber and a coating assembly. The coating assembly includes a vapor source, a substrate holder, a remote anode electrically coupled to the cathode target, and a cathode chamber assembly. The cathode chamber assembly includes a cathode target, an optional primary anode and a shield which isolates the cathode target from the vacuum chamber. The shield defines an opening for transmitting an electron emission current of a remote arc discharge from the cathode target to the remote anode that streams along the target face long dimension. A primary power supply is connected between the cathode target and the primary anode while a secondary power supply is connected between the cathode target and the remote anode. Characteristically, a linear remote anode dimension and a vapor source short dimension are parallel to a dimension in which an arc spot is steered along the cathode target.

Low pressure arc plasma immersion coating vapor deposition and ion treatment

A vacuum coating and plasma treatment system includes a magnetron cathode with a long edge and a short edge. The magnetic pole of the magnetron results in an electromagnetic barrier. At least one remote arc discharge is generated separate from the magnetron cathode and in close proximity to the cathode so that it is confined within a volume adjacent to the magnetron target. The remote arc discharge extends parallel to the long edge of the magnetron target and is defined by the surface of the target on one side and the electromagnetic barrier on all other sides. There is a remote arc discharge cathode hood and anode hood extending over the arc discharge and across the short edge of the magnetron cathode. Outside of the plasma assembly is a magnetic system creating magnetic field lines which extend into and confine the plasma in front of the substrate.

An erosion and corrosion resistant protective coating for turbomachinery application includes at least one ceramic or metal-ceramic coating segment deposited on surface of a conductive metal substrate subjected to a pre-deposition treatment by at least blasting to provide the surface with texture. The erosion and corrosion resistant coating has a plurality of dome-like structures with dome width between in range from about 0.01 &#x3bc;m to about 30 &#x3bc;m. The at least one coating segment is formed by condensation of ion bombardment from a metal-gaseous plasma flow, wherein, at least during deposition of first micron of the coating segment, deposition rate of metal ions is at least 3 &#x3bc;m/hr and kinetic energy of deposited metal ions exceeds 5 eV.

Erosion and corrosion resistant protective coatings for turbomachinery

An apparatus for generating energetic particles and application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting and focusing system communicating with a primary cathodic arc plasma source in a cathode chamber and a distal anode in a coating chamber. A coating chamber comprises a substrate holder off of an optical axis of the plasma source. A set of baffles are installed along the walls of cathode chambers and the plasma duct not occupied with plasma sources and in some embodiments across the plasma stream to trap macroparticles and neutrals. A plasma duct has a deflecting portion with attached cathode chamber and a tunnel portion attached to the coating chamber. The deflecting system comprises a deflecting coil surrounding the cathode chamber having an off-set deflecting conductor spaced from the plasma duct. In one embodiment a magnetron source is magnetically coupled with cathodic arc source.

Filtered cathodic arc method, apparatus and applications thereof

A wear resistant coating protects against corrosion and erosion of the thin metal protective sheath on turbomachinery applications. The coating has a metal layer overlaid by a ceramic layer. Multiple metal and ceramic layers can make up the coating with the layers varying in thickness allowing the layers nearer the substrate to remain more malleable to bend with the sheath and those layers nearer the top of the coating to be more brittle and resistant to wear. A cold spray metallic layer applied to the substrate provides a lightweight, flexible layer beneath the corrosion and erosion resistant protective multilayer coating.

Growing community of inventors

Bozeman, MN, United States of America

Vladimir I Gorokhovsky