Carl Zeiss Smt Gmbh

Scantinel Photonics Gmbh

Carl Zeiss Ag

Vladimir Davydenko

Markus Deguenther

Manfred Maul

Frank Schlesener

Thomas Korb

Axel Scholz

Nils Haverkamp

Michael Gerhard

Thomas Bischoff

Gerhard-Wilhelm Ziegler

Thomas Stammler

Daniel Walldorf

Stephan Kellner

Mirco Kern

Igor Hurevich

Damian Fiolka

Johannes Eisenmenger

Wolfgang Hoegele

Stefanie Hilt

Johannes Wangler

Peter Westphal

Dirk Juergens

Gerd Reisinger

Stefan Wolfgang Schmidt

Markus Degünther

Sandeep Ummethala

Matthias Kuss

Naser Hosseini

Geert Jozef Ivo Morthier

Markus DEGÜNTHER

Wolfgang Högele

A device for scanning measurement of the distance to an object comprises a light source that produces optical signals each having a varying frequency. An optical distribution matrix comprising optical switches and/or optical splitters distributes the optical signals simultaneously or successively onto optical output waveguides. A deflection optical unit deflects the optical signals when exiting from the optical output waveguides so that they are emitted in different directions from the device. A plurality of detectors detect a superposition of one of the optical signals produced by the light source with an optical signal which was reflected from the object. Input waveguides, which are independent of the output waveguides, guide the optical signals reflected from the object to the detectors while bypassing the optical distribution matrix. An evaluation unit determines a distance to the object from the superposition detected by the detectors.

Device and method for scanning measurement of the distance to an object

An apparatus and method for scanning ascertainment of a distance to an object are disclosed. Lasers of a light source emit a plurality of optical signals each having a time-varying frequency. At a given time, the frequencies of the optical signals are different. An evaluation device ascertains the distance to the object on the basis of measurement optical signals that were emitted by the light source and reflected or scattered at the object, and of reference optical signals that were emitted by the light source and were not reflected or scattered at the object. A dispersive scanning device simultaneously deflects the optical signals in different frequency-dependent directions.

Apparatus and method for scanning ascertainment of the distance to an object

A device for scanning Frequency-Modulated Continuous Wave LiDAR range measurement comprises a light source that produces light having a varying frequency, a splitter that splits the light into reference light and output light, and a distribution matrix () that distributes the output light among a plurality of free space couplers that outcouple the output light into free space. A plurality of optical waveguides guide input light that was reflected at an object. A detector detects a superposition of the input light with the reference light, and a calculation unit determines the range to the object from the superposition detected by the detector. The device further comprises a common optical waveguide that is optically connected to the plurality of optical waveguides and the detector so that input light that is guided in any of the optical waveguides propagates through the common optical waveguide towards the detector without passing the distribution matrix.

Device and method for scanning frequency-modulated continuous wave (FMCW) LiDAR range measurement

A device for scanning measurement of a distance to an object has a light source, which generates an optical output signal having a time-varying frequency. The device includes multiple optical processing units, which are connected optically in parallel to the light source. Each processing unit has an optical distribution matrix including multiple optical switches that distribute optical output signals selectively onto different optical waveguides. Optical output signals are outcoupled into the free space via free space couplers and optical output signals reflected on the object are coupled as optical measurement signals into the waveguides. A detector detects a superposition of the optical measurement signal and the optical output signal generated by the light source. A circulator directs optical output signals supplied by the light source to the distribution matrix and optical measurement signals coming from the distribution matrix to the detector.

The disclosure provides an illumination system of a microlithographic projection device having an image plane, in which a mask can be arranged, and a first object plane, which is optically conjugate to the image plane. A first illumination optical unit illuminates the first object plane with first projection light so that the first projection light has a first illumination angle distribution in the image plane. A second illumination optical unit illuminates a second object plane, which is optically conjugate to the image plane, with second projection light so that the second projection light has a second illumination angle distribution differing from the first illumination angle distribution in the image plane. An optical integrator is arranged exclusively in the light path of the first projection light.

Illumination system of a microlithographic projection device and method for operating such a system

A microlithography illumination system includes a first light source configured to generate pulses of light, a second light source configured to generate further pulses of light offset temporally relative to the pulses of light generated by the first light source, an array of optical elements digitally switchable between first and second switching positions, and a control device to drive the optical elements so that during use the switching position of the optical elements is unchanged while any of the first and second light sources generates a light pulse. In the first switching position of the optical elements, the array couples light pulses generated by the first light source into a common beam path of the illumination system. In the second switching position of the optical elements, the array couples light pulses generated by the second light source into a common beam path of the illumination system.

Lighting system of a microlithographic projection exposure system and method for operating such a lighting system

A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.

Illumination system for microlithography

An illumination system of a microlithographic projection exposure apparatus includes a light source operated in a pulsed manner and a DMD (digital mirror device) or another array of optical elements, which are digitally switchable between two switching positions.

An illumination system of a microlithographic projection exposure apparatus includes a pupil forming unit directing light on a spatial light modulator that transmits or reflects impinging light in a spatially resolved manner. An objective images a light exit surface of the spatial light modulator on light entrance facets of an optical integrator so that an image of an object area on the light exit surface completely coincides with one of the light entrance facets. The pupil forming unit and the spatial light modulator are controlled so that the object area is completely illuminated by the pupil forming unit and projection light associated with a point in the object area is at least partially and variably prevented from impinging on the one of the light entrance facets.

Illumination system of a microlithographic projection exposure apparatus

An illumination system of a microlithographic projection exposure apparatus includes a light source operated in a pulsed fashion and an array of optical elements which are digitally switchable between two switching positions. The array may be produced using MEMS technology.

A microlithography illumination system includes a first raster arrangement including a first plurality of bundle-forming raster elements arranged in or adjacent a first plane of the illumination system. The first plurality of bundle-forming raster elements is configured to generate a raster arrangement of secondary light sources. The illumination system also includes a transmission optics configured to superimpose transmission of the illumination light of the secondary light sources into the object field. The transmission optics includes a second raster arrangement comprising a second plurality of bundle-forming raster elements. The illumination system further includes a displacement device configured to displace a displaceable segment of the first raster arrangement relative to the second raster arrangement. The displaceable segment includes exactly one of the raster elements, a group of several raster elements, a raster column, a raster area, or several groups of raster elements.

An optical hollow waveguide assembly () includes an optical hollow waveguide () for guiding illumination light (). The hollow waveguide () has a tubular main body () with a continuous waveguide cavity (). The waveguide cavity has an illumination light inlet () and an illumination light outlet (). A cavity inner wall () of the waveguide cavity () is configured to be highly reflective for the illumination light () under grazing incidence. A gas source () has a fluid connection () to the waveguide cavity (). The resulting hollow waveguide assembly exhibits a reduced risk of contamination of the hollow waveguide.

Optical hollow waveguide assembly

An illumination system of a microlithographic projection exposure apparatus includes an optical integrator having a plurality of light entrance facets each being associated with a secondary light source. A spatial light modulator has a light exit surface and transmit or to reflect impinging projection light in a spatially resolved manner. A pupil forming unit directs projection light on the spatial light modulator. An objective images the light exit surface of the spatial light modulator onto the light entrance facets of the optical integrator. The light exit surface of the optical light modulator includes groups of object areas being separated by areas that are not imaged on the light entrance facets. The objective combines images of the object areas so that the images of the object areas abut on the optical integrator.

An illumination system includes an optical integrator having a plurality of light entrance facets, whose images at least substantially superimpose in a mask plane. A spatial light modulator transmits or reflects impinging projection light in a spatially resolved manner. A pupil forming unit directs projection light onto the spatial light modulator. An objective images a light exit surface of the spatial light modulator onto the light entrance facets of the optical integrator so that an image of an object area on the light exit surface completely coincides with one of the light entrance facets. A control unit controls the spatial light modulator such that along a scan direction a length of an image, which is formed on a mask from a light pattern in the object area, gradually increases at a beginning of a scan cycle and gradually decreases at the end of the scan cycle.

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Bad Herrenalb, Germany

Vladimir Davydenko