Synopsys, Inc.

Other

Magma Design Automation, Inc.

Vivek Raghavan

Anirudh Devgan

Alfred Wong

Tao Lin

Emre Tuncer

Hui Zheng

Alessandra Nardi

Amir Ajami

Pramod Thazhathethil

Brian A Zimmerman

Roderick Metcalfe

A method for performing leakage analysis includes receiving information specifying an integrated circuit. A neighborhood of shapes associated with the integrated circuit is then determined. Leakage information associated with the integrated circuit is generated based on the neighborhood of shapes. The neighborhood of shapes may be determined by determining a first set of spacings to a boundary of a first cell from an internal shape. A second set of spacings may be determined from the boundary of the first cell to a shape of a second cell. A lithography process may be characterized using the first and second set of spacings.

Lithography aware leakage analysis

A method for performing timing analysis includes receiving information specifying an integrated circuit. A neighborhood of shapes associated with the integrated circuit is then determined. Delay information associated with the integrated circuit is generated based on the neighborhood of shapes. The neighborhood of shapes may be determined by determining a first set of spacings to a boundary of a first cell from an internal shape. A second set of spacings may be determined from the boundary of the first cell to a shape of a second cell. A lithography process may be characterized using the first and second set of spacings.

Lithography aware timing analysis

A system and a method are disclosed for integrating the results of lithographic simulation into the physical synthesis process. The effects of lithographic variation are considered when selecting a cell from among a group of cells having equivalent function. Circuit design elements are placed and routed with consideration of the effects of lithographic variation on robustness, timing performance, and leakage current. Cells may be simulated under a variety of conditions and environments and the simulation results stored in a library for efficient lithographically optimized placements.

Lithographically optimized placement tool

Methods, apparatus and computer program products are provided that perform the operations of extracting first estimates of the resistance and capacitance of each of a first plurality of nets in an integrated circuit and then determining, for each of the first plurality of nets, a respective maximum delay model that attributes all of the first estimate of the resistance of the respective net to a front-end of the net and all of the first estimate of the capacitance of the respective net to a back-end of the net. Respective minimum delay models are also obtained for each of the first plurality of nets. Each of these minimum delay models attributes all of the first estimate of the resistance of the respective net to the back-end of the net and all of the first estimate of the capacitance of the respective net to a front-end of the net. These minimum and maximum delay models are then used in the determination of minimum and maximum delay estimates for each of the first plurality of nets. The delay estimates are then used to determine a net timing error bound associated with each net. These net timing error bounds are then filtered against a user-specified net timing error tolerance to determine which nets have an excessive timing error bound. Those nets having excessive timing error bounds are then modeled using more accurate models.

Methods, apparatus and computer program products for performing post-layout verification of microelectronic circuits using best and worst case delay models for nets therein

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Mountain View, CA, United States of America

Vivek Raghavan