Lpe S.p.a.

E.t.c. Epitaxial Technology Center Srl

Vittorio Pozzetti

Franco Preti

Vincenzo Ogliari

Danilo Crippa

Piergiovanni Poggi

Speciale Natale

A device for handling substrates, used in an epitaxial apparatus or reactor ( ) for chemical vapour deposition (CVD) onto the said substrates, comprises an internal robot ( ) provided with means ( ) for gripping and transporting substrates, which are in the form of semiconductor slices ( ), in order to transfer them from cassettes ( ) containing the semiconductor slices ( ) to be processed, the gripping and transportation means ( ) having precisely the task of transporting the slices ( ), which are present in a purging chamber ( ) and supplied from a cassette ( ) for storage of the said slices ( ), from the purging chamber ( ) into a reaction chamber ( ) of the epitaxial reactor ( ) and, more particularly, into seats ( ) formed on a flat disk-shaped susceptor ( ) which is present in the reaction chamber ( ) of the epitaxial reactor ( ) and vice versa, from the reaction chamber ( ) again passing through the purging chamber ( ), to the cassettes ( ).

Device and method for handling substrates by means of a self-leveling vacuum system in epitaxial induction

A reactor for chemical vapor deposition of epitaxial layers on crystalline substrates uses a medium frequency heating system, the power for the heating being provided by a multi-turn coil, inducing electrical currents in a susceptor of electrically conductive material, such as graphite, housed in a transparent bell jar. The internal sides of the turns of the coil are optically finished to reflect back heat to the susceptor irradiated therefrom during operation. Heating is controlled by substracting or adding reactive currents from or to different turns of the coil and through properly shaping the walls of the susceptor in order to control temperature gradients therein.

Epitaxial reactors

Growing community of inventors

Brugherio, Italy

Vittorio Pozzetti