Analog Devices,inc.

Vineet Kumar

John Albert Geen

William Albert Clark

Steven J Sherman

Edward L Wolfe

Harvey Weinberg

Jinbo Kuang

William Giudice

Detecting and/or mitigating the presence of particle contaminants in a MEMS device involves converting benign areas in which particles might become trapped undetectably by electric fields during test to field-free regions by extending otherwise non-functional conductive shield and gate layers and placing the same electrical potential on the conductive shield and gate layers. Particle contaminants can then be moved into detection locations remote from the potential trap areas and having particle detection structures by providing some mechanical disturbance.

Detection and mitigation of particle contaminants in MEMS devices

Detecting and/or mitigating the presence of particle contaminants in a MEMS device involves including MEMS structures that in normal operation are robust against the presence of particles but which can be made sensitive to that presence during a test mode prior to use, e.g., by switching the impedance of sensitive structures between an exceptionally sensitive condition during test and a normal sensitivity during operation; surrounding sensitive nodes with guard elements that are at the same potential as those nodes during operation, thereby offering protection against bridging particles, but are at a very different potential during test and reveal the particles by their resulting leakage currents; extending the sensitive nodes to interdigitate with or otherwise extend adjacent to the guard structures, which neither contribute to nor detract from the device operation but cover otherwise open areas with detection means during test; and/or converting benign areas in which particles might become trapped undetectably by electric fields during test to field-free regions by extending otherwise non-functional conductive layers so that the particles can then be moved into detection locations by providing some mechanical disturbance.

In a micromachined devices having a movable shuttle driven in oscillation, measuring the electrical charge accumulated on opposing drive capacitors to determine the displacement of the movable shuttle. Alternately, in such a micromachined device, measuring the electrical charge accumulated on a drive capacitor and comparing the measured electrical charge to a nominal electrical charge to determine the displacement of the movable shuttle.

Method and apparatus for a micromachined multisensor

A calibration system for an inertial sensor includes a calibration module for processing an output value produced by the inertial sensor, the output value related to a detected movement of an object, wherein the calibration module calculates an offset value from a plurality of output values, and memory operatively coupled with the calibration module, the memory capable of storing the plurality of output values and/or the offset value, wherein the inertial sensor is calibrated using the calculated offset value.

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Wakefield, MA, United States of America

Vineet Kumar