Advanced Micro Devices Corporation

Advanced Micro Device, Inc.

Vincent L Marinaro

Eric Richard Kent

Ted Wakamiya

Gerry Peffer

Christopher Lee Pike

The present invention provides for a geometrically shaped pouch and container system for use in the storage, handling and dispensing of liquid chemicals. This system will result in far greater liquid chemical utilization efficiencies.

Apparatus to reduce wasting of unused photoresist in semiconductor containers

An apparatus for indicating a fluid level in a reservoir includes a conduit for communication with a reservoir and including a sight glass. A buoyant primary float is provided within the conduit, and a stop is provided within the conduit for engaging the primary float to prevent travel of the primary float beyond an upper portion of the conduit. A buoyant secondary float in the conduit is moveable together with the primary float when the primary float is not engaged by the stop, and is moveable separately from the primary float when the primary float is engaged by the stop and a fluid level in the conduit exceeds the level of the stop such that a portion of the secondary float may travel separately within the upper portion of the conduit. The secondary float preferable includes an elongate portion that passes through an aperture in the primary float, and a buoyant upper portion that is located above the primary float and is larger than the aperture in the primary float. The secondary float also preferably includes a lower portion that is located below the primary float and is larger than the aperture in the primary float. The length of the elongate member between the upper and lower portions may be provided to correspond to a distance between a lower surface of the primary float when engaged by the stop, and a predetermined fluid level in the conduit such as the maximum fill level of the reservoir. The elongate member may also include markings calibrated to indicated a remaining fluid capacity of the reservoir relative to a predetermined capacity. A temperature control unit that includes a sight glass with the aforementioned primary and secondary floats is also disclosed.

Temperature control unit and sight glass

An apparatus for cleaning dried photoresist from a photoresist dispensing nozzle. The tip of the photoresist dispensing nozzle is inserted through an opening in a nozzle base. A catch pan is positioned beneath the nozzle base. A solvent dispensing needle is inserted through an opening in the catch pan to face the photoresist dispensing nozzle tip and sprays solvent onto the photoresist dispensing nozzle tip. The catch pan collects the solvent and dissolved photoresist particles. The catch pan includes a drain for draining the solvent and the dissolved photoresist particles.

Apparatus for automatically cleaning resist nozzle

A mechanism for effectively dispensing liquid onto a surface of an IC (Integrated Circuit) wafer with minimized back-splash. A nozzle includes a liquid chamber that fills up with the liquid to be dispensed onto the surface of the IC wafer, and the nozzle includes a plurality of nozzle passages. A nozzle passage carries and directs the liquid from the liquid chamber toward the surface of the IC wafer to provide a respective liquid stream from a respective location on the nozzle to a respective spot on the surface of the IC wafer as the IC wafer is spinning. A nozzle passage is disposed within the nozzle at a respective angle with respect to the surface of the IC wafer such that the respective liquid stream from the nozzle passage is directed toward a velocity vector at the respective spot on the surface of the IC wafer where the respective liquid stream hits the surface of the IC wafer. For example, the respective angle of the nozzle passage with respect to the surface of the IC wafer may be 45&deg;. The angling of the liquid stream toward the velocity vector on the IC wafer as the IC wafer spins reduces back-splash when the liquid stream hits the IC wafer. In addition, the liquid stream may be applied onto the surface of the IC wafer with relatively low pressure. Thus, the nozzle of the present invention dispenses liquid onto the surface of the IC wafer with minimized back-splash to reduce bubble defects within the integrated circuit fabricated on the surface of the IC wafer.

Mechanism for dispensing liquid onto an integrated circuit wafer with minimized back-splash

Embodiments of the invention comprise a new device and technique to realize an improved temperature control for a chemical photoresist developer utilizing a preexisting integrated single reservoir. This improvement is achieved by providing for a modified temperature control unit and procedure. The temperature control unit preferably comprises a plurality of heat exchanger conduits that are each supplied by an inlet manifold, and then exhausted via an outlet manifold. The temperature control unit preferably extends fully within the modified nozzle unit. By utilizing the improved temperature control unit, a first and second volumetric allocation of developer may be issued so that both may be dispensed within a relatively short period of time upon a photoresist layer surface in a temperature controlled state.

Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer

A developer nozzle used to apply developer and other chemicals to a wafer in the processing of semiconductors is kept free of hardened developer or other chemicals by placing a comb-like device in a position that will let the comb be inserted into the spray holes of the nozzle when the nozzle is not in use. The teeth of the comb are tapered for easy insertion by the robot or other programmed device that controls motion of the nozzle. Although hardened developer is the principal concern in such processing, an appropriate comb can be used to maintain the cleanliness of other nozzles used in semiconductor processing.

Developer nozzle clean combs

An adjustment error in a photolithographic stepping printer is detected by applying photoresist to a semiconductor wafer, and exposing the wafer to substantially identical light images in multiple locations using a stepping printer. The light images are defined by an optical reticle and include a plurality of lines or other features that are spaced from each other at approximately the resolution limit of the printer. Developer (,) is applied to the wafer to produce visible images corresponding to the light images. The visible images function as diffraction gratings which reflect light from the wafer. The visible images are inspected optoelectronically or manually. An adjustment error is determined to exist if the visible images appear substantially identical but are uneven or otherwise abnormal.

Method for detecting adjustment error in photolithographic stepping printer

A method and system for measuring a fluid in a photolithography track is disclosed. The method includes dispensing the fluid in a photolithography track into a self-contained reservoir, and measuring the volume of the fluid using the self-contained reservoir. In a preferred embodiment, the reservoir receives the fluid from the dispenser through a drain pipe. By measuring the volume of fluid in this manner, spillage of fluid is prevented because the volume measuring apparatus in accordance with the present invention is self-contained. This prevents corrosion and other damage to the parts of the photolithography track which come into contact with the spilled fluid. With no spillage, a more consistent volume measurement is obtained. The volume measurement is also much quicker to perform than conventional methods.

Method and system for measuring fluid volume in a photolithography track

A storage apparatus for photoresist dispensing nozzles has solvent inlets positioned directly opposite the nozzles when the nozzles are in their home positions. Photoresist cleaning solvent is introduced through these inlets at periodic intervals and directly applied on the nozzles to keep them clean.

Method for automatically cleaning resist nozzle

A mechanism for effectively removing unwanted material stuck on a hot plate for holding an IC (Integrated Circuit) wafer at an operating temperature during fabrication of the IC wafer. A cleaning head includes a rough surface, facing a bottom of the cleaning head, for scraping against the unwanted material on the hot plate to remove the unwanted material from the hot plate. Additionally, the cleaning head includes a vacuum port, disposed near the rough surface and facing the bottom of the cleaning head, for sucking away the loose unwanted material scraped from the hot plate by the rough surface. Furthermore, a handle is coupled to the cleaning head, and an operator manipulates the handle to cause movement of the cleaning head with respect to the hot plate. In a general aspect of the present invention, the cleaning head is made of material having a melting temperature higher than the operating temperature of the hot plate such that the cleaning head is used to remove the unwanted material from the hot plate while the hot plate is at the operating temperature. Thus, because the hot plate is cleaned without first cooling down the hot plate, down time for cleaning the hot plate is minimized during fabrication of integrated circuits on the IC wafers.

Mechanism for cleaning an integrated circuit wafer hot plate while the

A malfunction in a photolithographic fabrication track is detected by applying photoresist to a semiconductor wafer, and exposing the wafer to substantially identical light images in multiple locations using a stepping printer. The light images are defined by an optical reticle and include a plurality of lines or other features that are spaced from each other at approximately the resolution limit of the printer. Developer is applied to the wafer to produce visible images corresponding to the light images. The visible images function as diffraction gratings which reflect light from the wafer. The visible images are inspected optoelectronically or manually. A malfunction is determined to exist if the visible images are not substantially identical.

Growing community of inventors

Sunnyvale, CA, United States of America

Vincent L Marinaro