Dalsa Semiconductor Inc.

Teledyne Dalsa Semiconductor, Inc.

Vincent Fortin

Luc M Ouellet

Jean Ouellet

A method of removing residues from an integrated device, in particular residues resulting from processing in HF vapor, is disclosed wherein the fabricated device is exposed to dry water vapor for a period of time sufficient to dissolve the residues in the dry water vapor.

Method for removing residues formed during the manufacture of MEMS devices

A structural film, typically of silicon, in MEMS or NEMS devices is fabricated by depositing the film in the presence of a gas other than nitrogen, and preferably argon as the carrier gas.

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Bromont, Canada

Vincent Fortin