Lam Research Corporation

Vinayakaraddy Gulabal

Gary B Lind

Ravi Vellanki

Michal Danek

Eric H Lenz

Patrick A Van Cleemput

Sanjay Gopinath

Shruti Vivek Thombare

Novy Sastrawati Tjokro

Sushanth Kondi

Gorun Butail

Michael Rumer

Andrew Paul Eib

Yen-Chang Chen

Eddie Ze Thean Ooi

Vishnu Sai Yalamarty

Prodyut Majumder

Mahendra Byrapura Manjunath

Swajeeth Pilot Panchangam

Yeshwanth Saghi

Manjunath Satyadevan

Keerthi Gowdaru

Robert McKinney

A fluid control system for a substrate processing system includes (M+N) inlets configured to fluidly connect to (M) solenoid valves and (N) standby solenoid valves, respectively, where (M) and (N) are integers greater than zero. (M) outputs are configured to be fluidly connected to (M) pneumatic valves. A valve switching system is configured to selectively block (1) to (N) of the M inlets corresponding to (1) to (N) failed ones of (M) solenoid valves, respectively, and supply fluid from (1) to (N) of the (N) standby solenoid valves to (1) to (N) of the (M) outputs corresponding to the (1) to (N) failed ones of (M) solenoid valves, respectively.

Solenoid bank with standby solenoid valves for controlling pneumatic valves of a substrate processing system

Various showerheads and methods are provided. A showerhead may include a faceplate partially defined by a front surface and a back surface, a back plate having a gas inlet, a first conical frustum surface, and a second conical frustum surface, a plenum volume fluidically connected to the gas inlet and at least partially defined by the gas inlet, the back surface of the faceplate, the first conical frustum surface, and the second conical frustum surface, and a baffle plate positioned within the plenum volume, and having a plurality of baffle plate through-holes extending through the baffle plate. The second conical frustum surface may be positioned radially outwards from the first conical frustum surface with respect to a center axis of the showerhead, and the second conical frustum surface may be positioned along the center axis farther from the gas inlet than the first conical frustum surface.

Metal deposition

A cleaning apparatus for a vacuum pedestal and method of cleaning a pedestal used in semiconductor device fabrication are described. The apparatus has a baseplate, a collar attached to the baseplate, a cap disposed on the collar, and a shaft that extends from the collar through the cap, collar and baseplate. A manual rotatable handle is attached to a shaft portion that extends from the cap. Motion of the handle in a downward direction is impeded by the cap. A disk is attached to a lower portion of the shaft and is separated from a bottom of the baseplate due to weighted rings, which are attached to the disk and surround the lower portion of the shaft such that a vertical float is present between the shaft and the cap. At least one abrasive pad is attached to the disk to remove build-up on the underlying pedestal surface.

Pedestal polishing apparatus

A heat shield structure for a substrate support in a substrate processing system includes an outer shield configured to surround a stem of the substrate support. The outer shield is further configured to define an inner volume between the outer shield and an upper portion of the stem and a lower surface of the substrate support and a vertical channel between the outer shield and a lower portion of the stem of the substrate support. The outer shield includes a cylindrical portion, a first lateral portion extending radially outward from the cylindrical portion, an angled portion extending radially outward and upward from the first lateral portion, and a second lateral portion extending radially outward from the angled portion.

Preventing deposition on pedestal in semiconductor substrate processing

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Yadgir, India

Vinayakaraddy Gulabal