Carl Zeiss Smt Gmbh

Viktor Kulitzki

Bernhard Gellrich

Stefan Xalter

Jens Prochnau

Marwène Nefzi

Peter Deufel

Ralf Zweering

Michael Erath

Yim-Bun Patrick Kwan

Andreas Wurmbrand

Steffen Fritzsche

Axel Lorenz

Hendrik Wagner

Stefan Schaff

Florian Ahles

Charles Seviour

Karsten Siegmanski

An optical arrangement, in particular a lithography system, includes: a movable component, in particular a mirror; at least one actuator for moving the component; and at least one stop having a stop face for delimiting the movement of the component. The optical arrangement further includes, on a stop or on a plurality of stops, at least two stop faces for delimiting the movement of the movable component in one and the same movement direction.

Optical arrangement, in particular lithography system

An optical arrangement, for example a lithography system, includes: a first component, in particular a carrying frame; a second component, in particular a mirror, which is movable in relation to the first component; and at least one stop with at least one stop face for limiting the movement of the second component in relation to the first component. The optical arrangement, preferably the stop, can have a fixing device for fixing the second component. The fixing device can have a fixing element that is movable in relation to the stop face of the stop. Further aspects of the device likewise relate to an optical arrangement with a fixing device or with a transport lock.

Optical arrangement, in particular lithography system, with a transport lock

A connection arrangement is provided for a force-fit connecting ceramic components for a lithography apparatus. The connection arrangement includes first and a second ceramic components and a clamping device. The clamping device directly clamps the first and the second ceramic component against one another in a force-fit manner.

Connection arrangement for a force-fit connection between ceramic components

An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.

Optical arrangement in a projection exposure apparatus for EUV lithography

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Zwickau, Germany

Viktor Kulitzki