Applied Materials, Inc.

Vijet Patil

Tsutomu Tanaka

Canfeng Lai

Khokan Chandra Paul

Carlaton Wong

Adam J Fischbach

Timothy Joseph Franklin

Ravikumar Patil

Exemplary semiconductor substrate supports may include a pedestal shaft. The semiconductor substrate supports may include a platen. The platen may define a fluid channel across a first surface of the platen. The semiconductor substrate supports may include a platen insulator positioned between the platen and the pedestal shaft. The semiconductor substrate supports may include a conductive puck coupled with the first surface of the platen and configured to contact a substrate supported on the semiconductor substrate support. The semiconductor substrate supports may include a conductive shield extending along a backside of the platen insulator and coupled between a portion of the platen insulator and the pedestal shaft.

Semiconductor processing chambers and methods for deposition and etch

Semiconductor processing chambers for deposition and etch

Growing community of inventors

Bengaluru, India

Vijet Patil