General Electric Company

Victor Mario Torres

David Alan Lilienfeld

Alexander Viktorovich Bolotnikov

Reza Ghandi

Stephen Daley Arthur

Michael J Hartig

Robert Dwayne Gossman

Stacey Joy Kennerly

Avinash Srikrishnan Kashyap

Gregory Keith Dudoff

A disclosed super-junction (SJ) device includes a first epitaxial (epi) layer that forms a first SJ layer of the SJ device, and includes a second epi layer disposed on the first SJ layer that forms a device layer of the SJ device. An active area of the first and second epi layers includes a first set of SJ pillars comprising a particular doping concentration of a first conductivity type and a second set of SJ pillars comprising the particular doping concentration of a second conductivity type. A termination area of the first and second epi layers has a minimized epi doping concentration of the first conductivity type that is less than the particular doping concentration, and the termination area of the second epi layer includes a plurality of floating regions of the second conductivity type that form a junction termination of the SJ device.

Systems and methods for junction termination of wide band gap super-junction power devices

The subject matter disclosed herein relates to semiconductor power devices and, more specifically, to junction termination designs for wide-bandgap (e.g., silicon carbide) semiconductor power devices. A disclosed semiconductor device includes a first epitaxial (epi) layer disposed on a substrate layer, wherein a termination area of the first epi layer has a minimized epi doping concentration of a first conductivity type (e.g., n-type). The device also includes a second epi layer disposed on the first epi layer, wherein a termination area of the second epi layer has the minimized epi doping concentration of the first conductivity type and includes a first plurality of floating regions of a second conductivity type (e.g., p-type) that form a first junction termination of the device.

Systems and methods for junction termination in semiconductor devices

Miniaturized current sensors are disclosed herein. The miniaturized current sensors may employ a coiled coil and a return coil around the current path to be measured. The miniaturized current sensors may be integrated to microelectronic devices and components.

Miniaturized current sensors

An integrated circuit die that may have one vertical transistor and one horizontal transistor is disclosed. The transistors may have substantially different breakdown voltages. The vertical transistor may be used in power circuitry applications and the horizontal transistor may be used in logic circuitry applications.

Integrated vertical and lateral semiconductor devices

A method for sputtering an aluminum layer on a surface of a semiconductor device is presented. The method includes three sputtering steps for depositing the aluminum layer, where each sputtering step includes at least one sputtering parameter that is different from a corresponding sputtering parameter of another sputtering step. The surface of the semiconductor device includes a dielectric layer having a plurality of openings formed through the dielectric layer.

Sputtering system and method for forming a metal layer on a semiconductor device

The present disclosure relates to a symmetrical, punch-through transient voltage suppression (TVS) device includes a mesa structure disposed on a semiconductor substrate. The mesa structure includes a first semiconductor layer of a first conductivity-type, a second semiconductor layer of a second conductivity-type disposed on the first semiconductor layer, and a third semiconductor layer of the first conductive-type disposed on the second semiconductor layer. The mesa structure also includes beveled sidewalls forming mesa angles with respect to the semiconductor substrate and edge implants disposed at lateral edges of the second semiconductor layer. The edge implants including dopants of the second conductive-type are configured to cause punch-through to occur in a bulk region and not in the lateral edges of the second semiconductor layer.

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Clifton Park, NY, United States of America

Victor Mario Torres