Essilor International (compagnie Generale D'optique)

Viatcheslav Safarov

Jean-Pierre Boilot

Frédéric Chaput

Khalid Lahlil

Jacques Peretti

Georges Lampel

Nathalie Landraud

The invention generally concerns a method involving emitting polarization light waves through an aperture with a dimension of maximum size lower than or equal to 100 nm, wherein the aperture is circumferentially bound by an opaque area that prevents the light waves from being propagated outside the aperture during use, and wherein the emitted polarization light waves (1) contact a material layer comprising a photosensitive compound whose surface is located at a distance lower than 100 nm from said aperture, and (2) induce a topographic modification of the material layer. In this manner, a stable structure is printed in relief in the material layer without requiring any additional development step. The invention is applicable, in certain embodiments, to ophthalmic optics.

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Arcueil, France

Viatcheslav Safarov