Other

Kaufman & Robinson, Inc.

Veeco Instruments Inc.

Front Range Fakel, Inc.

Colorado Advanced Technology LLC

Viacheslav V Zhurin

Harold R Kaufman

James R Kahn

David Alan Baldwin

Todd Lanier Hylton

Lyudmila V Zhurin

Daniel E Siegfried

David Matthew Burtner

Raymond S Robinson

Scott A Townsend

Kirk A Thompson

Antonina Ivanovna Bugrova

Aleksei Vasilievich Desiatskov

Aleksei Ivanovich Morozov

Vadim Konstantinovich Kharchevnikov

Victor B Tikhonov

Evgeny Vitalievich Klyuev

Herbert Rudolf Schaal

Antonina I Bugrova

Vadim K Kharchevnikov

Aleksei V Desiatskov

Aleksei I Morozov

There is presented a detailed electronic method for simulation of a firefly, other insects, or organisms producing bioluminescence and with light radiation functions similar to a real firefly, other insects, or organisms producing bioluminescence. An illuminated artificial firefly, other insects, or organisms producing bioluminescence can be placed on trees and shrubs in landscape, or at home to produce radiation, at night time, and blinking a gradually decaying light. More particularly it relates to a decorative type of device in the form of a firefly, other insects, or organisms producing bioluminescence and with light radiation functions similar to a real firefly, other insects, or organisms producing bioluminescence. The light is simulated by an electronics program that is a part of compact device with the form of a real firefly, other insects, or organisms producing bioluminescence. Short radiation pulses of microsecond-millisecond duration time in violet and ultraviolet range of radiation wavelengths can be utilized for scaring birds or other animals from undesirable or dangerous places of human activity, such as airports, contaminated ponds, wind turbines, electorized fences and antennas.

Periodic lighting device

A Hall-current ion source with a narrow ion beam energy distribution is presented. A narrow ion beam energy distribution is provided by a utilization of a multi-chamber anode through which a working gas is applied and delivers a uniform working gas distribution in a discharge channel. Introduction of a working gas through a lower part of anode makes applied electric potential in a narrow area and leading to enhanced conditions for a working gas ionization, high ion beam current, high translation of a discharge voltage into a 'monochromatic' ion beam mean energy distribution. A multi-chamber anode with a slit exit for introduction of a working gas into area under anode is utilized to prevent a backflow of insulating and dielectric depositions on anode parts, and under anode area makes a nominal operation with reactive gases without a phenomenon called as 'anode poisoning' during long operating hours. The ion source with a shielded Hot Filament design shows very effective ion beam neutralization properties; it produces less heating of the substrate than a traditional one; it has a cleaner ion beam because its beam is not contaminated by the Hot Filament material particles. In the design with two Hot Filaments the ion source operation is extended for tens of hours.

Hall-current ion source with improved ion beam energy distribution

An ion source is cooled using a cooling plate that is separate and independent of the anode. The cooling plate forms a coolant cavity through which a fluid coolant (e.g., liquid or gas) can flow to cool the anode. In such configurations, the magnet may be thermally protected by the cooling plate. A thermally conductive material in a thermal transfer interface component can enhance the cooling capacity of the cooling plate. Furthermore, the separation of the cooling plate and the anode allows the cooling plate and cooling lines to be electrically isolated from the high voltage of the anode (e.g., using a thermally conductive, electrically insulating material). Combining these structures into an anode subassembly and magnet subassembly can also facilitate assembly and maintenance of the ion source, particularly as the anode is free of coolant lines, which can present some difficulty during maintenance.

Fluid-cooled ion source

A Hall-current ion source for generation of low and high energy ion beams with selection of magnetic fields and emission currents, where there are utilized low magnetic fields and high emission currents that are higher than discharge currents for low energy ion beams, 15-100 eV; high magnetic fields and emission currents that are equal to discharge currents are utilized for discharge voltages providing ion beam energies of 100-500 eV. Other measures are utilized for protection of a gas distribution area and a magnet from pinching by an ion beam penetration through a reflector by a buffer chamber providing better gas distribution in anode area, a protective ring in a center part of a reflector, and others.

Hall-current ion source for ion beams of low and high energy for technological applications

In accordance with an embodiment of the invention, the hygienic toilet with a user protection from evacuations is designed. A self-foaming liquid soap as a high efficiency absorbing substance is used from contaminations produced during evacuations. A water tank is comprised of two compartments: one is for flashing water that could be a regular gravity tank, or a pressure assisted flash water, and a separate compartment is for a self-foaming liquid soap. A toilet bowl is designed with two rims: one is for a flashing water and another one for a soap foam. A soap foam is applied into a bowl walls and on a water surface on a bowl bottom for protection from evacuations and reflections into a user. Analysis of a liquid flow in a toilet bowl made possible to utilize a theory of surface waves in a bowl exit outlet designed in the form of a converging-expanding channel with a high velocity liquid flow through the toilet bowl without disturbances and atomizing effects and providing a maximum efficiency detergency of bowl walls.

Hygienic high detergency toilet

Compressed air is utilized for water evacuation from water hose or other liquid containing systems. A freeze-free water hose device is provided which includes an air pump-compressor means, a Y-coupling with a water faucet. In one case, there is utilized one Y-coupling with one shut-off valve and an air-compressor means in a water faucet vicinity or on a faucet's wall. In another case, there is utilized a Y-coupling at a water faucet with one shut-off valves and a Y-coupling with three shut-off valves at a water hose reel. Yet in another case, there are utilized two Y-couplings each with two shut-off valves: one Y-coupling at a faucet and another at a water hose reel. In this case, a compressed air means is assembled with a water hose reel. This device is utilized also in beer, soda and water industry for cleaning lines with chemicals or pure water.

Freeze-free water hose

A Hall-type ion source for generation of ion beams for technological applications presents itself a hybrid ion source, where properties of closed drift systems and end-Hall ion sources are combined for more efficient operation. An ion source has shorter central magnetic pole than regular closed drift ion source with magnetic screens that provide positive magnetic gradient in an ion source's discharge channel. An ion source with these combined properties has higher ratio of ion beam current to discharge current than end-Hall ion source and wider range of discharge parameters than closed drift ion source.

High-efficient ion source with improved magnetic field

In this invention the system and processes for organization of oil refinery from gases and heavy admixtures with a separation of purified oil for fractions obtained in the process of thermal distillation, and thermal and catalytic cracking and subsequent fine separation of products for narrow fractions are presented. The combining of vortex vapor generation processes of preliminary heated oil in the field of inertia forces of rotating liquid with condensation processes of gaseous products at reduced pressure in vortex vapor condensers with cooled walls with utilization of subsequent heating and productions of fuels with narrow fraction composition permits to obtain a high quality product. New types of vortex devices are presented: the vortex separator of oil from water and admixtures, the vortex vapor generator for production of fine vapor fractions, the vortex vapor condenser for condensation of vaporized fractions, the vortex vapor generator in a catalyst layer moving in a boiling layer, which is a catalytic reactor with a regulated contact time between a catalyst and a boiling layer. A two-zone combustion furnace helps to decrease energy spending, improves combustion completeness.

System for thermal and catalytic cracking of crude oil

In one embodiment of this invention, the apparatus for sputter deposition within an evacuated volume comprises a compact gridless ion source into which an ionizable gas is introduced and from which ions leave with directed energies at or near the sputtering threshold and a sputter target near that source, biased negative relative to the surrounding vacuum enclosure, and located within the beam of ions leaving that source. Particles sputtered from the target are deposited on a deposition substrate spaced from both the ion source and the sputter target. An energetic beam of electrons can be generated by the incident ions striking the negatively biased sputter target and the deposition substrate is located either within or outside of this beam, depending on whether the net effect of bombardment by energetic electrons is beneficial or detrimental to that particular deposition process.

Apparatus for sputter deposition

In accordance with one specific embodiment of the present invention, a Hall-current ion source of the end-Hall type has an anode that is contoured with one or more recesses in the electron-collecting surface which have areas that are protected from the deposition of externally generated contamination thereon, as well as one or more protrusions that have higher temperatures than the bulk of the anode, thereby increasing the removal or passivation of coatings during operation by the thermal degradation of the coating and the effects of thermomechanical stresses. In another specific embodiment, which can be combined with the above embodiment, electrically isolated baffle or baffles are located to protect a substantial fraction of the electron-collecting surface of the anode from the deposition of externally generated contamination thereon.

Hall-current ion source

In accordance with one embodiment of the present invention, the ion-beam apparatus takes the form of a gridless ion source with a hot-filament cathode-neutralizer, in which the hot filament is heated with a current from the cathode-neutralizer heater. The cathode-neutralizer is connected to the negative terminal of the discharge supply for the gridless ion source. This connection is substantially isolated from ground (the potential of the surrounding vacuum chamber, which is usually at earth ground) and its potential is measured relative to ground. The heater current to the cathode-neutralizer is controlled by adjusting it so as to maintain this potential in a narrow operating range. This control can be manual or automatic.

Ion-source neutralization with a hot-filament cathode-neutralizer

In accordance with one specific embodiment of the present invention, the apparatus for sputter deposition within an evacuated volume comprises a compact ion source to generate ions into which an ionizable gas is introduced and from which ions leave with directed energies near or below the sputtering threshold, a sputter target near that source and located within the beam of ions leaving that source, a sputter target with a grounded shield that defines the target portion exposed to sputtering, and a power supply to bias the target negative relative to ground so that ions are attracted to and sputter the target. Particles sputtered from the target are deposited on a deposition substrate separate from both the ion source and the sputter target. For an insulating target, the target is biased with a radiofrequency power supply and the bias has a mean negative value rather than a direct-current negative value relative to ground. The rate and energy with which the ions arrive at the target determine the rate with which that target is sputtered and the deposition rate on the substrate. In using a compact gridless ion source, the high pressure required for generating ions is confined to the ion source, reducing the pumping gas load. For ion energies at or near the sputtering threshold, the sputtering from extraneous hardware is reduced or eliminated. In addition, the target biases can be low enough to minimize the damage due to energetic neutrals that result from reflection of energetic target ions.

In accordance with an embodiment of the present invention, apparatus for ion-assisted magnetron deposition takes a form that includes a magnetron, a deposition substrate displaced from the magnetron, and an ion source also displaced from the magnetron and located so that the ion beam from the ion source is directed at the deposition substrate. The ion source is operated without an electron-emitting cathode-neutralizer, the electron current for this function being provided by electrons from the magnetron. In one specific embodiment, the ion source is operated so that the potential of the deposition substrate is maintained close to that of a common ground for the magnetron and the ion source. In another embodiment, the ion source is of the Hall-current type and the discharge current of the ion source is approximately equal in magnitude to the current of the magnetron discharge.

Ion-assisted magnetron deposition

In one embodiment of a compact closed-drift ion source, an ionizable gas is introduced into a annular discharge region. An anode is at one end of this region and an electron-emitting cathode is near the opposite and open end. A magnetic circuit extends from an inner pole piece to an outer pole piece, with both pole pieces near the open end. The electron current in the discharge region interacts with the magnetic field therein to generate and accelerate ions out of the open end. A permeable enclosure surrounds the anode end of the discharge region. Adjacent elements of the permeable enclosure, the inner pole piece, and any intermediate permeable elements are in close proximity, one to the next. A magnetizing means is located only between the outer pole piece and the permeable enclosure.

Magnetic field for small closed-drift ion source

In accordance with one specific embodiment of the present invention, the closed drift hollow cathode comprises an axisymmetric discharge region into which an ionizable gas is introduced, an annular electron emitting cathode insert disposed laterally about that discharge region, a surrounding enclosure, an aperture in that enclosure disposed near the axis of symmetry and at one end of that region, and a magnetic field within that region which is both axisymmetric and generally disposed transverse to a path from the cathode insert to the aperture. An electrical discharge is established between the cathode insert and the enclosure. The electrons emitted from the cathode insert drift in closed paths around the axis, collide with molecules of ionizable gas, and sustain the discharge plasma by generating additional electron-ion pairs. Ions from the plasma bombard the cathode insert, thereby maintaining an emissive temperature. Electrons from the plasma diffuse to and escape through the aperture to provide the electron emission. The closed drift nature of the discharge circumferentially distributes the heating of the cathode insert and the utilization of the electron emitting capabilities thereof. The discharge current controls the maximum value of the electron emission.

Growing community of inventors

Ft. Collins, CO, United States of America

Viacheslav V Zhurin