Basf Aktiengesellschaft

Basf Se Corporation

Verena Weiskopf

Wolfgang Siegel

Hermann Luyken

Robert Baumann

Ulrike Licht

Gerd Haderlein

Michael Bartsch

Jens Scheidel

Till Gerlach

Dirk Wulff

Peter Pfab

Tobias Aechtner

Kirsten Wenz

Franz Niklaus Windlin

Harald Winsel

Uwe Duesterwald

Markus Ruckpaul

Uwe DÜSTERWALD

A description is given of a process for preparing solutions of radiation-sensitive, free-radically polymerizable organic compounds, where a first starting compound, which has an acid halide group, and a second starting compound, which has an alcoholic hydroxyl group, are esterified with one another in a solvent or in a solvent mixture. The solvent comprises one or more ketones having a boiling point of below 150&#xb0; C. under atmospheric pressure (1 bar), or the solvent mixture is composed to an extent of at least 50% by weight of said ketones. One of the two starting compounds has at least one radiation-sensitive group and the other of the two starting compounds has at least one ethylenically unsaturated, free-radically polymerizable group. A description is also given of corresponding solutions of radiation-sensitive, free-radically polymerizable organic compounds and of their use for preparing radiation-crosslinkable, free-radically copolymerized copolymers, more particularly for hotmelt pressure-sensitive adhesives or aqueous polymer dispersions.

Process for preparing solutions of radiation-sensitive, free-radically polymerizable organic compounds

A process for hydrogenating nitrile functions present in organic compounds over at least one heterogeneous catalyst, in which the hydrogenation is carried out in the presence of an ionic liquid, is described.

Nitrile hydrogenation on heterogeneous catalysts in the presence of ionic liquids

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Alsheim, Germany

Verena Weiskopf